Patents by Inventor Stephane Dana

Stephane Dana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Track-based metrology method and apparatus
    Patent number: 8513625
    Abstract: A photolithographic track system and method for semiconductor wafer manufacture having a plurality of stations for receiving a wafer for sequential processing, including a first group of stations for performing at least a part of a photolithography process. A metrology station is provided in a position of the track system after the first group of stations, for determining whether the processed wafer is within tolerance for at least one critical dimension. If not within tolerance, the wafer is moved by the track system to a stripping station for removal of at least one layer and a return to the beginning of the first group of stations for repeating the performance of a photolithography process. Parameters may also be adjusted for purposes of the repeated performance of the process. If within tolerance, the wafer may be moved for further processing, for example, baking or off loading.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: August 20, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Stephane Dana, Joseph Bach
  • AFM-based lithography metrology tool
    Publication number: 20050205776
    Abstract: A photolithographic track system and method for semiconductor wafer manufacture having a plurality of stations for receiving a wafer for sequential processing, including a first group of stations for performing at least a part of a photolithography process. A metrology station is provided in a position of the track system after the first group of stations, for determining whether the processed wafer is within tolerance for at least one critical dimension. If not within tolerance, the wafer is moved by the track system to a stripping station for removal of at least one layer and a return to the beginning of the first group of stations for repeating the performance of a photolithography process. Parameters may also be adjusted for purposes of the repeated performance of the process. If within tolerance, the wafer may be moved for further processing, for example, baking or off loading.
    Type: Application
    Filed: May 16, 2005
    Publication date: September 22, 2005
    Inventors: Stephane Dana, Joseph Bach
  • AFM-based lithography metrology tool
    Publication number: 20020158197
    Abstract: A photolithographic track system for semiconductor wafer manufacture, that includes an Atomic Force Microscope (AFM), having a scanning stylus probe measurement device coupled to the AFM head, for measuring overlay between masks and layers in an inspected wafer, so as to generate overlay data. The AFM is situated in-track.
    Type: Application
    Filed: April 30, 2002
    Publication date: October 31, 2002
    Applicant: APPLIED MATERIALS, INC
    Inventors: Stephane Dana, Joseph Bach
  • AFM-based lithography metrology tool
    Patent number: 6392229
    Abstract: A photolithographic track system for semiconductor wafer manufacture, that includes an Atomic Force Microscope (AFM), having a scanning stylus probe measurement device coupled to the AFM head, for measuring overlay between masks and layers in an inspected wafer, so as to generate overlay data. The AFM is situated in-track.
    Type: Grant
    Filed: January 12, 1999
    Date of Patent: May 21, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Stephane Dana, Joseph Bach