Patents by Inventor Stephane Jean Louis Bechu

Stephane Jean Louis Bechu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning device and cleaning process for a plasma reactor
    Patent number: 9812298
    Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.
    Type: Grant
    Filed: June 24, 2014
    Date of Patent: November 7, 2017
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), UNIVERSITE JOSEPH FOURIER—GRENOBLE 1
    Inventors: Jacques Henri Pelletier, Ana Lacoste, Alexandre Bes, Stephane Jean Louis Bechu, Jerome Sirou
  • CLEANING DEVICE AND CLEANING PROCESS FOR A PLASMA REACTOR
    Publication number: 20140305467
    Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.
    Type: Application
    Filed: June 24, 2014
    Publication date: October 16, 2014
    Inventors: Jacques Henri Pelletier, Ana Lacoste, Alexandre Bes, Stephane Jean Louis Bechu, Jerome Sirou
  • Cleaning device and cleaning process for a plasma reactor
    Publication number: 20100252067
    Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.
    Type: Application
    Filed: June 13, 2007
    Publication date: October 7, 2010
    Inventors: Jacques Henri Pelletier, Ana Lacoste, Alexandre Bes, Stéphane Jean Louis Bechu, Jérôme Sirou