Patents by Inventor Stephane Mazereau

Stephane Mazereau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
    Patent number: 8491963
    Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).
    Type: Grant
    Filed: March 14, 2012
    Date of Patent: July 23, 2013
    Assignee: Snecma Propulsion Solide
    Inventors: Franck Lamouroux, Sébastien Bertrand, Stéphane Goujard, Alain Caillaud, Francis Bagilet, Stéphane Mazereau
  • METHOD OF DENSIFYING THIN POROUS SUBSTRATES BY CHEMICAL VAPOR INFILTRATION, AND A LOADING DEVICE FOR SUCH SUBSTRATES
    Publication number: 20120171375
    Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).
    Type: Application
    Filed: March 14, 2012
    Publication date: July 5, 2012
    Inventors: Franck Lamouroux, Sébastien Bertrand, Stéphane Goujard, Alain Caillaud, Francis Bagilet, Stéphane Mazereau
  • Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
    Patent number: 8163088
    Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: April 24, 2012
    Assignee: Snecma Propulsion Solide
    Inventors: Franck Lamouroux, Sébastien Bertrand, Stéphane Goujard, Alain Caillaud, Francis Bagilet, Stéphane Mazereau
  • Method For the Densification of Thin Porous Substrates By Means of Vapour Phase Chemical Infiltration and Device For Loading Such Substrates
    Publication number: 20080152803
    Abstract: To densify thin porous substrates (1) by chemical vapor infiltration, the invention proposes using loading tooling (10) comprising a tubular duct (10) disposed between first and second plates (12, 13) and around which the thin substrates for densification are disposed radially. The tooling as loaded in this way is then placed inside a reaction chamber (20) in an infiltration oven having a reactive gas admission inlet (21) connected to the tubular duct (11) to enable a reactive gas to be admitted into the duct which distributes the gas along the main faces on the substrates (1) in a flow direction that is essentially radial. The reactive gas can also flow in the opposite direction, i.e. it can be admitted into the tooling (10) from its outer envelope (16) and can be removed via the duct (11).
    Type: Application
    Filed: February 16, 2006
    Publication date: June 26, 2008
    Inventors: Franck Lamouroux, Sebastien Bertrand, Stephane Goujard, Alain Caillaud, Francis Bagilet, Stephane Mazereau