Patents by Inventor Stephanie Audran

Stephanie Audran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TESTING DEVICE
    Publication number: 20240183745
    Abstract: A device for testing an optical device, comprising a first structure comprising a substrate made of a first material and at least two first pillars of cylindrical shape made of a second material crossing the substrate, the second material having an optical index different from the optical index of the first material.
    Type: Application
    Filed: November 29, 2023
    Publication date: June 6, 2024
    Applicant: STMicroelectronics (Crolles 2) SAS
    Inventors: Stephanie AUDRAN, Elodie SUNGAUER, Simon GUILLAUMET
  • HYDROGEL COMPRISING GLYCEROL AND A CARBOMER FOR TREATING THE RESPIRATORY SYMPTOMS OF COVID-19 DISEASE VIA THE NASAL ROUTE
    Publication number: 20230330013
    Abstract: The invention relates to a product for treating viral diseases, such as COVID-19, via the nasal route. The product comprises a hydrogel based on water, glycerol and a carbomer.
    Type: Application
    Filed: August 3, 2021
    Publication date: October 19, 2023
    Inventors: Stéphanie AUDRAN, Daniel GREFF
  • Method for determining a grey level etch mask
    Patent number: 8490028
    Abstract: A method for determining, by means of a computer, a photolithography mask for the manufacturing a microstructure by grey level etching of a resist layer, this mask including a plurality of elementary cells, each including an opaque area arranged, in top view, in a non-peripheral portion of a transparent region or, conversely, in a transparent area arranged, in top view, in a non-peripheral portion of an opaque region, comprising the steps of: a) initializing the mask pattern in a first state; b) determining, by simulation, the profile of the microstructure which would result from the use of the mask according to said pattern; c) adjusting said pattern by modifying, in certain cells, the position of the opaque or transparent area within the cell; and d) forming the mask according to said pattern.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: July 16, 2013
    Assignee: STMicroelectronics (Crolles 2) SAS
    Inventors: Vincent Farys, Stephanie Audran
  • Method for Determining A Grey Level Etch Mask
    Publication number: 20120148943
    Abstract: A method for determining, by means of a computer, a photolithography mask for the manufacturing a microstructure by grey level etching of a resist layer, this mask including a plurality of elementary cells, each including an opaque area arranged, in top view, in a non-peripheral portion of a transparent region or, conversely, in a transparent area arranged, in top view, in a non-peripheral portion of an opaque region, comprising the steps of: a) initializing the mask pattern in a first state; b) determining, by simulation, the profile of the microstructure which would result from the use of the mask according to said pattern; c) adjusting said pattern by modifying, in certain cells, the position of the opaque or transparent area within the cell; and d) forming the mask according to said pattern.
    Type: Application
    Filed: September 22, 2011
    Publication date: June 14, 2012
    Applicant: STMicroelectronics SAS
    Inventors: Vincent Farys, Stephanie Audran