Patents by Inventor Stephanie J. Dilocker

Stephanie J. Dilocker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8535872
    Abstract: An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composition being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: September 17, 2013
    Assignee: Fujifilm Electronic Materials, U.S.A., Inc.
    Inventors: Binod B. De, Ognian N. Dimov, Stephanie J. Dilocker
  • Publication number: 20120178871
    Abstract: An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composirion being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
    Type: Application
    Filed: March 21, 2012
    Publication date: July 12, 2012
    Inventors: Binod B. De, Ognian N. Dimov, Stephanie J. Dilocker
  • Patent number: 8153346
    Abstract: An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composition being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
    Type: Grant
    Filed: February 20, 2008
    Date of Patent: April 10, 2012
    Assignee: FUJIFILM Electronic Materials, U.S.A., Inc.
    Inventors: Binod B. De, Ognian N. Dimov, Stephanie J. Dilocker
  • Publication number: 20080206676
    Abstract: An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composition being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
    Type: Application
    Filed: February 20, 2008
    Publication date: August 28, 2008
    Inventors: Binod B. De, Ognian N. Dimov, Stephanie J. Dilocker
  • Patent number: 6916543
    Abstract: Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: July 12, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Binod B. De, Sanjay Malik, Stephanie J. Dilocker, Ognian N. Dimov
  • Patent number: 6830870
    Abstract: A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: wherein R1, R4, R5 and R6 are each independently H, lower alkyl, CH2CO2R10, cyano, CH2CN, or halogen, wherein R10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R2 is CHR11R12 where R11 and R12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R3 is linear, branched or cyclic fluoroalkyl group or SiR13R14R15 where R13, R14, and R15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(═O)—O—(CH2)x where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cycl
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: December 14, 2004
    Assignee: Arch Speciality Chemicals, Inc.
    Inventors: Sanjay Malik, Stephanie J. Dilocker, Binod B. De
  • Publication number: 20040137362
    Abstract: Novel copolymers suitable for forming the top layer photoimagable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.
    Type: Application
    Filed: October 31, 2003
    Publication date: July 15, 2004
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Binod B. De, Sanjay Malik, Stephanie J. Dilocker, Ognian N. Dimov
  • Publication number: 20040034160
    Abstract: A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: February 19, 2004
    Applicant: ARCH SPECIALITY CHEMICALS, INC.
    Inventors: Sanjay Malik, Stephanie J. Dilocker, Binod B. De