Abstract: Use, as a milling agent for milling a suspension, wet dispersing agent or for surface treatment, of a powder comprising more than 90% by mass of sintered balls, each sintered ball having: a chemical composition such that, in percentages by mass based on the mass of the ball: 89%?W?97%; 5%?C?8%; Co?0.5%; Ni?0.5%; Elements other than W, C, Co, and Ni, or “Other elements”: ?3%; a tungsten carbide(s) content greater than 55% in percentage by mass based on the crystallized phases; a bulk density greater than or equal to 14 g/cm3.

Abstract: A chemical mechanical polishing (CMP) slurry can comprise a plurality of particles distributed in a carrier, wherein at least a portion of the particles of the plurality of particles can have a body including a core comprising zirconia and a shell overlying at least a portion of the core, wherein the shell comprises silica; an oxidizing agent; and a carrier. The CMP slurry can comprise at least one of a Hydrogen Peroxide Stability % Reduction of not greater than 50%; and a high copper material removal rate.

Abstract: A composition having a plurality of abrasive particles including alumina, the plurality of abrasive particles have mesoporosity with an average meso branching index of at least 55 junctions/microns2 and a median particle size (D50) of at least 5 microns.

Abstract: A sintered ball having: a chemical composition such that, in percentages by mass based on the mass of the ball: 89%?W?97%; 5%?C?8%; Co?0.5%; Ni?0.5%; Elements other than W, C, Co, and Ni, or “Other elements”: ?3%; a tungsten carbide(s) content greater than 55% in percentage by mass based on the crystallized phases; a bulk density greater than or equal to 14 g/cm3.

Abstract: A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.

Abstract: The present disclosure is directed to an alpha alumina powder having a specific surface area, a specific crystallite size, and a specific particle size distribution for use in abrasive polishes, and method of making such powder. The method of making the alpha alumina powder can include calcining an aluminum oxide precursor powder at a temperature of 800-1500° C. and milling the calcined powder to the specific particle size distribution. The alpha alumina powder disclosed herein can quickly enable high removal rate with undiminished aesthetic quality when used in abrasive polishes.

Abstract: A composition including a carrier comprising a liquid, an abrasive particulate contained in the carrier, an accelerant contained in the carrier, the accelerant including at least one free anion selected from the group of iodide (I?), bromide (Br?), fluoride (F?), sulfate (SO42?), sulfide (S2?), sulfite (SO32?), chloride (Cl?), silicate (SiO44?), phosphate (PO43?), nitrate (NO3?), carbonate (CO32?), perchlorate (ClO4?), or any combination thereof, and a buffer contained in a saturated concentration in the carrier, the buffer including a compound selected from MaFx, NbFx, MaNbFx, MaIx, NbIx, MaNbIx, MaBrx, NbBrx, MaNbBrx, Ma(SO4)x, Nb(SO4)x, MaNb(SO4)x, MaSx, NbSx, MaNbSx, Ma(SiO4)x, Nb(SiO4)x, MaNb(SiO4)x, Ma(PO4)x, Nb(PO4)x, MaNb(PO4)x, Ma(NO3)x, Nb(NO3)x, MaNb(NO3)x, Ma(CO3)x, Nb(CO3)x, MaNb(CO3)x, or any combination, wherein M represents a metal element or metal compound; N represents a non-metal element; and a, b, and x is 1-6.

Abstract: A composition having a plurality of abrasive particles including alumina, the plurality of abrasive particles have mesoporosity with an average meso branching index of at least 55 junctions/microns2 and a median particle size (D50) of at least 5 microns.

Abstract: A body including a first phase having silicon carbide, a second phase comprising a metal oxide, the second phase being a discrete intergranular phase located at the grain boundaries of the first phase, and the body has an average strength of at least 700 MPa.

Abstract: A proppant material can include a core and an extended-release coating overlying the core. The extended release coating can include a polymer and an additive contained within the polymer.

Abstract: A composition can comprise a carrier including a liquid and an abrasive particulate contained in the carrier, the abrasive particulate having, on average, at least 10 wt % cerium oxide in the abrasive particulate and a cerium 3+ ratio (Ce 3+/total cerium) of at least 0.1. In another embodiment, a slurry composition can comprise a liquid carrier comprising water, cerium oxide particles, and free silicate ions, wherein a material removal rate when polishing a silicon oxide wafer can be is increased by at least 3% in comparison to a slurry composition not including free silicate ions.

Abstract: A composition including a carrier comprising a liquid, an abrasive particulate contained in the carrier, an accelerant contained in the carrier, the accelerant including at least one free anion selected from the group of iodide (I?), bromide (Br?), fluoride (F?), sulfate (SO42?), sulfide (S2?), sulfite (SO32?), chloride (Cl?), silicate (SiO44?), phosphate (PO43?), nitrate (NO3?), carbonate (CO32?), perchlorate (ClO4?), or any combination thereof, and a buffer contained in a saturated concentration in the carrier, the buffer including a compound selected from MaFx, NbFx, MaNbFx, MaIx, NbIx, MaNbIx, MaBrx, NbBrx, MaNbBrx, Ma(SO4)x, Nb(SO4)x, MaNb(SO4)x, MaSx, NbSx, MaNbSx, Ma(SiO4)x, Nb(SiO4)x, MaNb(SiO4)x, Ma(PO4)x, Nb(PO4)x, MaNb(PO4)x, Ma(NO3)x, Nb(NO3)x, MaNb(NO3)x, Ma(CO3)x, Nb(CO3)x, MaNb(CO3)x, or any combination, wherein M represents a metal element or metal compound; N represents a non-metal element; and a, b, and x is 1-6.

Abstract: An armor component including a body having a first portion including calcium boride compounds include non-stoichiometric calcium boride (CaBx) and stoichiometric calcium boride (CaB6) and having a density of at least about 80% theoretical density. In one aspect, the first portion can include a first phase comprising silicon carbide (SiC) and a second phase comprising calcium boride (CaB6). In another aspect, the first portion can further include a third phase comprising boron carbide (B4C).

Abstract: The present disclosure is directed to an alpha alumina powder having a specific surface area, a specific crystallite size, and a specific particle size distribution for use in abrasive polishes, and method of making such powder. The method of making the alpha alumina powder can include calcining an aluminum oxide precursor powder at a temperature of 800-1500° C. and milling the calcined powder to the specific particle size distribution. The alpha alumina powder disclosed herein can quickly enable high removal rate with undiminished aesthetic quality when used in abrasive polishes.

Abstract: The present disclosure is directed to a boron nitride powder with a controlled boron oxide level and method of making such powder. The method of making the BN—B2O3 powder can include heat treating a high fired boron nitride powder at a temperature of 800-1200° C. for a period of 0.5-5 hours. The BN—B2O3 powder disclosed herein has low attrition, high strength, good flow behavior, high resistance to hydration, and low ionic conductivity.

Abstract: A proppant material can include a core and an extended-release coating overlying the core. The extended release coating can include a polymer and an additive contained within the polymer.

Abstract: An armor component including a body having a first portion including calcium boride compounds include non-stoichiometric calcium boride (CaBx) and stoichiometric calcium boride (TiO2) and having a density of at least about 80% theoretical density. In one aspect, the first portion can include a first phase comprising silicon carbide (SiC) and a second phase comprising calcium boride (TiO2). In another aspect, the first portion can further include a third phase comprising boron carbide (B4C).

Abstract: An armor component including a body having a first portion including calcium boride compounds include non-stoichiometric calcium boride (CaBx) and stoichiometric calcium boride (CaB6) and having a density of at least about 80% theoretical density. In one aspect, the first portion can include a first phase comprising silicon carbide (SiC) and a second phase comprising calcium boride (CaB6). In another aspect, the first portion can further include a third phase comprising boron carbide (B4C).

Abstract: An armor component including a body having a first portion including calcium boride compounds include non-stoichiometric calcium boride (CaBx) and stoichiometric calcium boride (CaB6) and having a density of at least about 80% theoretical density. In one aspect, the first portion can include a first phase comprising silicon carbide (SiC) and a second phase comprising calcium boride (CaB6). In another aspect, the first portion can further include a third phase comprising boron carbide (B4C).

Abstract: An abrasive article including a core including an organic material and a first bonded abrasive body integrally bonded directly to the core, the first bonded abrasive body having abrasive particles contained within a bond material and the abrasive article having a bonding factor of at least about 60%.