Abstract: A head wearable air purifier is provided. The head wearable air purifier includes a first speaker assembly and a second speaker assembly. The first speaker assembly includes a filter assembly, a motor-driven impeller for creating an airflow through the filter assembly, and an air outlet downstream from the filter assembly for emitting a filtered airflow from the speaker assembly. The head wearable air purifier further includes a nozzle and a control circuit. The nozzle is arranged to receive the filtered airflow from the first speaker assembly. Further, the nozzle includes an air outlet arranged to emit the received filtered airflow from the head wearable air purifier. The control circuit is arranged to control a rotational speed of the motor-driven impeller of the first speaker assembly such that the maximum rotational speed of the motor-driven impeller is from 9,000 to 18,000 RPM.

Abstract: There is provided an ear cup including a housing containing a filter assembly and a motor-driven impeller for creating an airflow through the filter assembly, the housing including an air outlet downstream from the filter assembly for emitting the filtered airflow from the housing. The ear cup further includes an acoustic driver carried by the housing, a reference internal noise sensor carried by the housing, and active noise control circuitry that is configured to use a signal provided by the reference internal noise sensor to operate the acoustic driver.

Abstract: There is provided an ear cup including a housing containing a filter assembly and a motor-driven impeller for creating an airflow through the filter assembly, the housing including an air outlet downstream from the filter assembly for emitting the filtered airflow from the housing. The ear cup further includes an acoustic driver mounted to the housing, a reference internal noise disposed within the housing and a reference ambient noise mounted to the housing. The ear cup further includes active noise control circuitry that is configured to simultaneously use both a signal provided by the reference internal noise and the signal provided by the reference ambient noise to operate the acoustic driver.

Abstract: There is provided an ear cup including a housing containing a filter assembly and a motor-driven impeller for creating an airflow through the filter assembly, the housing including an air outlet downstream from the filter assembly for emitting the filtered airflow from the housing. The ear cup further includes an acoustic driver carried by or mounted to, either directly or indirectly, the housing, a reference internal noise sensor disposed within the housing, and a reference ambient noise sensor carried by or mounted to, either directly or indirectly, the housing. The ear cup further includes active noise control circuitry that is configured, in a first operating state, to use a signal provided by the reference internal noise sensor to operate the acoustic driver and, in a second operating state, to use a signal provided by the reference ambient noise sensor to operate the acoustic driver.

Abstract: A pump assembly for a dental cleaning appliance includes a fluid chamber, a piston, and a drive. Magnets, connected respectively to the piston and the drive, enable the drive to couple to the piston and move it within the fluid chamber to draw fluid into the fluid chamber. A stop prevents the piston from being pulled beyond a stop position so that through continued actuation of the drive the magnets separate to allow a spring to push the piston away from the stop position to urge a burst of fluid from the fluid chamber.

Abstract: A method of fabricating a patterned polyimide film on a semiconductor wafer including spin coating the wafer with a polyimide precursor solution, baking the polyimide precursor solution in order to remove solvents from and to slightly cure the solution to form a polyimide film, and rinsing the polyimide film with deionized water immediately following the baking step prior to further processing. The rinsing in part serves to further remove solvents associated with the polyimide film. The process continues with photolithography techniques in which the wafer spin coated with a selected photoresist to form a photoresist film immediately following the rinsing step, and a baking of the photoresist film. Thereafter, the photoresist film is exposed to radiation through a photomask, and developed with a solution to form a pattern. The pattern is then etched into the polyimide film with the solution. The remaining portions of the photoresist are removed with a chemical stripper.