Patents by Inventor Stephen Duan-Fu Hsu

Stephen Duan-Fu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
    Patent number: 7774736
    Abstract: A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining an interference map based on the target pattern, the interference map defining areas of constructive interference and areas of destructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; and placing assist features in the mask design based on the areas of constructive interference and the areas of destructive interference.
    Type: Grant
    Filed: March 6, 2007
    Date of Patent: August 10, 2010
    Assignee: ASML MaskTools B.V.
    Inventors: Douglas Van Den Broeke, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Duan-Fu Hsu
  • Orientation dependent shielding for use with dipole illumination techniques
    Patent number: 7725872
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Grant
    Filed: May 3, 2007
    Date of Patent: May 25, 2010
    Assignee: ASML Masktools, B.V.
    Inventors: Stephen Duan-Fu Hsu, Noel Corcoran, Jang Fung Chen
  • Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
    Patent number: 7247574
    Abstract: A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining an interference map based on the target pattern, the interference map defining areas of constructive interference and areas of destructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; and placing assist features in the mask design based on the areas of constructive interference and the areas of destructive interference.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: July 24, 2007
    Assignee: ASML Masktools B.V.
    Inventors: Douglas Van Den Broeke, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Duan-Fu Hsu
  • Orientation dependent shielding for use with dipole illumination techniques
    Patent number: 7246342
    Abstract: A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X-pole illumination; and illuminating said horizontal component mask utilizing a Y-pole illumination.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: July 17, 2007
    Assignee: ASML Masktools B.V.
    Inventors: Stephen Duan-Fu Hsu, Noel Corcoran, Jang Fung Chen
  • Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
    Publication number: 20040209170
    Abstract: A method of generating a mask design having optical proximity correction features disposed therein. The methods includes the steps of obtaining a desired target pattern having features to be imaged on a substrate; determining an interference map based on the target pattern, the interference map defining areas of constructive interference and areas of destructive interference between at least one of the features to be imaged and a field area adjacent the at least one feature; and placing assist features in the mask design based on the areas of constructive interference and the areas of destructive interference.
    Type: Application
    Filed: January 14, 2004
    Publication date: October 21, 2004
    Inventors: Douglas Van Den Broeke, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Duan-Fu Hsu