Patents by Inventor Stephen E. Bottomley

Stephen E. Bottomley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Formation of thin film resistors
    Patent number: 6500350
    Abstract: A method is provided for forming a patterned layer of resistive material in electrical contact with a layer of electrically conducting material. A three-layer structure is formed which comprises a metal conductive layer, an intermediate layer formed of material which is degradable by a chemical etchant, and a layer of resistive material of sufficient porosity such that the chemical etchant for said intermediate layer may seep through the resistive material and chemically degrade said intermediate layer so that the resistive material may be ablated from said conductive layer wherever the intermediate layer is chemically degraded. A patterned photoresist layer is formed on the resistive material layer. The resistive material layer is exposed to the chemical etchant for said intermediate layer so that the etchant seeps through the porous resistive material layer and degrades the intermediate layer. Then, portions of the resistive material layer are ablated away wherever the intermediate layer has been degraded.
    Type: Grant
    Filed: February 8, 2001
    Date of Patent: December 31, 2002
    Assignee: Morton International, Inc.
    Inventors: Andrew T. Hunt, Wen-Yi Lin, Shara S. Shoup, Richard W. Carpenter, Stephen E. Bottomley, Tzyy Jiuan Hwang, Michelle Hendrick
  • Formation of thin film resistors
    Patent number: 6329899
    Abstract: A method is provided for forming a patterned layer of resistive material in electrical contact with a layer of electrically conducting material. A three-layer structure is formed which comprises a metal conductive layer, an intermediate layer formed of material which is degradable by a chemical etchant, and a layer of resistive material of sufficient porosity such that the chemical etchant for said intermediate layer may seep through the resistive material and chemically degrade said intermediate layer so that the resistive material may be ablated from said conductive layer wherever the intermediate layer is chemically degraded. A patterned photoresist layer is formed on the resistive material layer. The resistive material layer is exposed to the chemical etchant for said intermediate layer so that the etchant seeps through the porous resistive material layer and degrades the intermediate layer. Then, portions of the resistive material layer are ablated away wherever the intermediate layer has been degraded.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: December 11, 2001
    Assignee: Microcoating Technologies, Inc.
    Inventors: Andrew T. Hunt, Wen-Yi Lin, Shara S. Shoup, Richard W. Carpenter, Stephen E. Bottomley, Tzyy Jiuan Hwang, Michelle Hendrick
  • Waterborne photoresists having binders with sulfonic acid functionality
    Patent number: 5411837
    Abstract: A waterborne photoimageable composition or photoresist comprises a latex binder polymer having acid acid functionality to render it developable in alkaline aqueous solution, at least about 50 mole percent of the acid functionality being sulfonic acid moieties, a photopolymerizeable monomer fraction, and a photoinitiator chemical system.
    Type: Grant
    Filed: May 12, 1994
    Date of Patent: May 2, 1995
    Assignee: Morton International, Inc.
    Inventors: Stephen E. Bottomley, Daniel E. Lundy, Betsy Dadah, Robert K. Barr