Patents by Inventor Stephen F. Marcotte, Jr.

Stephen F. Marcotte, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
    Patent number: 5250392
    Abstract: A negative-working, radiation-sensitive composition comprising an admixture in a solvent of:(a) at least one cyclized rubber polymer,(b) at least one photoactive compound, and(c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q;wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ;wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; andwherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.
    Type: Grant
    Filed: January 25, 1993
    Date of Patent: October 5, 1993
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Stephen F. Marcotte, Jr., John Griffiths
  • Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
    Patent number: 5206110
    Abstract: A negative-working, radiation-sensitive composition comprising an admixture in a solvent of:(a) at least one cyclized rubber polymer,(b) at least one photoactive compound, and(c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q;wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ;wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; andwherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.
    Type: Grant
    Filed: February 4, 1991
    Date of Patent: April 27, 1993
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Stephen F. Marcotte, Jr., John Griffiths
  • Aqueous developing solution and its use in developing positive-working photoresist composition
    Patent number: 4828965
    Abstract: An aqueous developing solution useful in developing positive-working photoresists comprising:______________________________________ A. Soluble Alkali Metal Phosphate 1.50-3.00% by weight B. Soluble Alkali Metal Silicate 1.00-2.00% by weight C. Mono (lower alkanol) amine 0.40-5.00% by weight D. Soluble Alkylene Glycol 0.25-3.00% by weight E. Lower Alkanol 0.05-1.00% by weight F.
    Type: Grant
    Filed: January 6, 1988
    Date of Patent: May 9, 1989
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Richard J. West, Stephen F. Marcotte, Jr., Faris A. Modawar