Abstract: A conformal micro- or nanopatterned nanoimprint lithography (NIL) master and methods of making and using same is disclosed. A conformal foil or film master with a patterned surface is provided for imprinting a substantially uniform pattern on a non-flat substrate. The conformal foil or film master may be mounted to a soft backing, which may be mounted to a rigid backing, to form conformal master structure. When pressed against a non-flat substrate, the conformal foil or film master substantially conforms to the contours and/or topology of the non-flat substrate to provide a substantially uniform pattern thereon.