Abstract: This invention relates to an illumination apparatus comprising: (a) at least one light source; (b) a light guide for accepting light from the at least one light source and for guiding the light using total internal reflection, the light guide having a top surface; (c) a light redirecting film having an input surface optically coupled with the top surface and an output surface for providing redirected light, wherein the input surface comprises a plurality of light redirecting features which are optically coupled to the top surface, each light redirecting feature having: (i) a first side comprising two or more planar segments; and (ii) a second side comprising two or more planar segments, wherein the first and second sides intersect at an apex.

Abstract: A method includes electro-mechanical engraving a pattern of cavities with well defined shapes in a surface. The surface is configured to micro replicate according to the pattern. The surface may be a pattern roller. The cavities may have complex cross sections and may be cut by multiple cutters. The molding pattern may be for micro replication of optical elements of a light redirecting film or a light extracting film.

Abstract: A method for expressing disparate profilometer (20) measurements in a common coordinate system, comprises the steps of providing a work-piece holder (10) with at least two reference features (14) having surfaces and centers; fixing a work-piece (16) in the work-piece holder (10); scanning (S1) the surfaces of the reference features (14); and determining the centers of the reference features (14) in at least an x1, y1 coordinate system. The next steps are scanning (S2) a surface of the first work-piece (16) and obtaining a measurement result; and transforming (S3) the measurement result into an xg, yg global coordinate system. The next step is repeating the above steps for successive work-piece surfaces, or successive work-pieces or the same work-piece at different times. The final steps are combining (S4) the measurement results in xg, yg global coordinate system and computing desired output.

Abstract: A machine for polishing a surface of a work piece has a precision sub-aperture polishing element. The polishing element has a compliant, toroidal polishing member mountable to a support member. A circumferential portion of the polishing member extends uniformly beyond the peripheral surface of the support member and forms a clearance with the work piece surface during polishing operations.