Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate, having a surface, including a first conductive pathway electrically coupled to a power source; an insulating material on the surface of the package substrate; a first microelectronic component, having a first surface facing the package substrate and an opposing second surface, embedded in the insulating material; a second microelectronic component, having a first surface facing the package substrate and an opposing second surface, embedded in the insulating material; a redistribution layer on the insulating material including a second conductive pathway electrically coupled to the second surface of the second microelectronic component and the second surface of the first microelectronic component; and a wire bond electrically coupling the first and the second conductive pathways.

Abstract: Technologies for micro-LED optical communication via glass waveguides are disclosed. In an illustrative embodiment, a glass interposer is mounted on a circuit board, and several integrated circuit (IC) dies are positioned above the glass interposer. A micro-LED assembly is mounted on each of the IC dies. Waveguides defined in the glass interposer can carry light between the micro-LED assemblies of the various IC dies, providing a high-bandwidth connection between the IC dies. The micro-LED assemblies can provide low-power, high-bandwidth connectivity between the IC dies and can operate in the high-temperature environment near the IC dies.

Abstract: Technologies for back side micro-LED assemblies are disclosed. In an illustrative embodiment, a micro-LED assembly includes several micro-LEDs and several photodiodes mounted on a base die. The base die is mounted on an integrated circuit (IC) die, such as a processor die. Through-silicon vias are defined in the IC die to carry electrical signals between the micro-LED assembly and transistors and other components near or at the front side of the IC die. An optical plug with an optical cable is positioned above the micro-LED assembly to couple light to and from the micro-LEDs and photodiodes. The short distance between the transistors on the front side of the IC die and the micro-LED assembly allows for high-bandwidth signals to be converted to optical signals with little loss. The optical cable can connect IC dies on the same circuit board, in the same housing, in the same rack, etc.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate, having a surface, including a first conductive pathway electrically coupled to a power source; a first microelectronic component, having an active side electrically coupled to the surface of the package substrate and an opposing back side, surrounded by an insulating material; a second microelectronic component, having an active side electrically coupled to the surface of the package substrate and an opposing back side, surrounded by the insulating material and including a through-substrate via (TSV) electrically coupled to the first conductive pathway; and a redistribution layer (RDL), on the insulating material, including a second conductive pathway electrically coupling the TSV, the second surface of the second microelectronic component, and the second surface of the first microelectronic component.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate including a first conductive pathway electrically coupled to a power source; a mold material on the package substrate including a first microelectronic component embedded in the mold material, a second microelectronic component embedded in the mold material, and a TMV, between the first and second microelectronic components, the TMV electrically coupled to the first conductive pathway; a redistribution layer (RDL) on the mold material including a second conductive pathway electrically coupled to the TMV; and a third microelectronic component on the RDL and electrically coupled to the second conductive pathway, wherein the second conductive pathway electrically couples the TMV, the first microelectronic component, and the third microelectronic component.

Abstract: In one embodiment, an apparatus includes a first die with voltage regulator circuitry and a second die with logic circuitry. The apparatus further includes an inductor, a capacitor, and a conformal power delivery structure on the top side of the apparatus, where the voltage regulator circuitry is connected to the logic circuitry through the inductor, the capacitor, and the conformal power delivery structure. The conformal power delivery structure includes a first electrically conductive layer defining one or more recesses, a second electrically conductive layer at least partially within the recesses of the first electrically conductive layer and having a lower surface that generally conforms with the upper surface of the first electrically conductive layer, and a dielectric material between the surfaces of the first electrically conductive layer and the second electrically conductive layer that conform with one another.

Abstract: Embodiments of a microelectronic assembly may include a first integrated circuit (IC) die having a first surface, a second surface opposite the first surface, and a third surface orthogonal to the first and second surfaces, the first IC die including a conductive trace that is parallel to the first and second surfaces, and the conductive trace is exposed at the third surface; and a second IC die including a fourth surface, wherein the fourth surface of the second IC die is electrically coupled to the third surface of the first IC die by an interconnect including solder.

Abstract: Techniques are disclosed herein for creating metal bitlines (BLs) in stacked wafer memory. Using techniques described herein, metal BLs are created on a bottom surface of a wafer. The metal BLs can be created using different processes. In some configurations, a salicide process is utilized. In other configurations, a damascene process is utilized. Using metal reduces the resistance of the BLs as compared to using non-metal diffused BLs. In some configurations, wafers are stacked and bonded together to form three-dimensional memory structures.

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate including a first conductive pathway electrically coupled to a power source; a first microelectronic component, embedded in an insulating material on the surface of the package substrate, including a through-substrate via (TSV) electrically coupled to the first conductive pathway; a second microelectronic component embedded in the insulating material; and a redistribution layer on the insulating material including a second conductive pathway electrically coupling the TSV, the second microelectronic component, and the first microelectronic component.

Abstract: A microfluidic device having a channel within a first material to thermally couple with an IC die. The channel defines an initial fluid path between a fluid inlet port and a fluid outlet port. A second material is within a portion of the channel. The second material supplements the first material to modify the initial fluid path into a final fluid path between the fluid inlet port and the fluid outlet port. The second material may have a different composition and/or microstructure than the first material.

Abstract: Techniques are disclosed herein for creating metal bitlines (BLs) in stacked wafer memory. Using techniques described herein, metal BLs are created on a bottom surface of a wafer. The metal BLs can be created using different processes. In some configurations, a salicide process is utilized. In other configurations, a damascene process is utilized. Using metal reduces the resistance of the BLs as compared to using non-metal diffused BLs. In some configurations, wafers are stacked and bonded together to form three-dimensional memory structures.

Abstract: An integrated circuit (IC) die package substrate comprises a first trace upon, or embedded within, a dielectric material. The first trace comprises a first metal and a first via coupled to the first trace. The first via comprises the first metal and a second trace upon, or embedded within, the dielectric material. A second via is coupled to the second trace, and at least one of the second trace or the second via comprises a second metal with a different microstructure or composition than the first metal.

Abstract: Techniques are disclosed herein for creating over and under interconnects. Using techniques described herein, over and under interconnects are created on an IC. Instead of creating signaling interconnects and power/ground interconnects on a same side of a chip assembly, the signaling interconnects can be placed on an opposing side of the chip assembly as compared to the power interconnects.

Abstract: Techniques are disclosed herein for creating metal bitlines (BLs) in stacked wafer memory. Using techniques described herein, metal BLs are created on a bottom surface of a wafer. The metal BLs can be created using different processes. In some configurations, a salicide process is utilized. In other configurations, a damascene process is utilized. Using metal reduces the resistance of the BLs as compared to using non-metal diffused BLs. In some configurations, wafers are stacked and bonded together to form three-dimensional memory structures.

Abstract: Techniques are disclosed herein for creating metal bitlines (BLs) in stacked wafer memory. Using techniques described herein, metal BLs are created on a bottom surface of a wafer. The metal BLs can be created using different processes. In some configurations, a salicide process is utilized. In other configurations, a damascene process is utilized. Using metal reduces the resistance of the BLs as compared to using non-metal diffused BLs. In some configurations, wafers are stacked and bonded together to form three-dimensional memory structures.

Abstract: Embodiments of a microelectronic assembly comprise: a first plurality of integrated circuit (IC) dies coupled on one end to a first IC die and on an opposing end to a second IC die, and a second plurality of IC dies coupled to at least the first IC die or the second IC die. Each IC die in the first plurality of IC dies includes a respective substrate and a respective metallization stack attached along a respective first planar interface, each of the first IC die and the second IC die includes a respective substrate and a respective metallization stack attached along a respective second planar interface, each IC die in the second plurality of IC dies includes a respective substrate and a respective metallization stack attached along a respective third planar interface, and the first planar interface is orthogonal to the second planar interface.

Abstract: Disclosed herein are microelectronic assemblies, as well as related apparatuses and methods. In some embodiments, a microelectronic assembly may include a plurality of vertically stacked dies; a trench of dielectric material through the plurality of vertically stacked dies; and a plurality of conductive vias extending through the trench of dielectric material, wherein individual ones of the plurality of conductive vias are electrically coupled to individual ones of the plurality of vertically stacked dies.

Abstract: Disclosed herein are microelectronic assemblies, as well as related apparatuses and methods. In some embodiments, a microelectronic assembly may include a plurality of dies stacked vertically; a trench of dielectric material extending through the plurality of dies; a conductive via extending through the trench of dielectric material; and a plurality of conductive pathways between the plurality of dies and the conductive via, wherein individual ones of the conductive pathways are electrically coupled to the conductive via and to individual ones of the plurality of dies, and wherein the individual ones of the plurality of conductive pathways have a first portion including a first material and a second portion including a second material different from the first material.

Abstract: Embodiments of an integrated circuit (IC) die comprise: a first region having a first surface and a second surface, the first surface being orthogonal to the second surface; and a second region attached to the first region along a planar interface that is orthogonal to the first surface and parallel to the second surface, the second region having a third surface coplanar with the first surface. The first region comprises: a dielectric material; layers of conductive traces in the dielectric material, each layer of the conductive traces being parallel to the second surface such that the conductive traces are orthogonal to the first surface; conductive vias through the dielectric material; and bond-pads on the first surface, the bond-pads comprising portions of the conductive traces exposed on the first surface, and the second region comprises a material different from the dielectric material.

Abstract: Embodiments of an integrated circuit (IC) die comprise: a metallization stack including a dielectric material, a plurality of layers of conductive traces in the dielectric material and conductive vias through the dielectric material; and a substrate attached to the metallization stack along a planar interface. The metallization stack comprises bond-pads on a first surface, a second surface, a third surface, a fourth surface, and a fifth surface. The first surface is parallel to the planar interface between the metallization stack and the substrate, the second surface is parallel to the third surface and orthogonal to the first surface, and the fourth surface is parallel to the fifth surface and orthogonal to the first surface and the second surface.