Abstract: A system for low light level image sensing is provided having: A photodiode; a transfer gate disposed in a center of the photodiode; an active gate disposed surrounded by the transfer gate; a plurality of microlenses, each microlens being disposed over a portion of the photodiode and directing light away from the transfer gate towards the photodiode.

Abstract: A system for low light level image sensing is provided having: A photodiode; a transfer gate disposed in a center of the photodiode; an active gate disposed surrounded by the transfer gate; a plurality of microlenses, each microlens being disposed over a portion of the photodiode and directing light away from the transfer gate towards the photodiode

Abstract: An improved patterning process, useful for the metallization of highly efficient photovoltaic cells, the formation of X-ray lithography masks in the sub half-micron range, and in the fabrication of VLSI and MMIC devices, is disclosed. The improved patterning process includes the steps of providing a substrate with a photoactive layer, patterning the photoactive layer with an inclined profile, depositing on both the substrate and the patterned photoactive layer a layer of disjointed metal such that the thickness of the metal layer exceeds that of the patterned photoactive layer and that the metal layer deposited on the substrate is formed with walls normal to the surface of the substrate. Preferably, the deposition of the disjointed metal layer is effected by evaporative metallization in a direction normal to the surface of the substrate. The deposited metal layer on the substrate is characterized by a high aspect ratio, with a rectangular cross section.