Patents by Inventor Stephen Peter Morgan

Stephen Peter Morgan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for determining an overlay error
    Patent number: 8908147
    Abstract: A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n?), p(n?) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: December 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Maurits Van Der Schaar, Andreas Fuchs, Martyn John Coogans, Kaustuve Bhattacharyya, Stephen Peter Morgan, Michael Kubis
  • Method and Apparatus for Determining an Overlay Error
    Publication number: 20120013881
    Abstract: A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n?), p(n?) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.
    Type: Application
    Filed: July 13, 2011
    Publication date: January 19, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Maurits VAN DER SCHAAR, Andreas Fuchs, Martyn John Coogans, Kaustuve Bhattacharyya, Stephen Peter Morgan, Michael Kubis