Patents by Inventor Stephen Q. Fine

Stephen Q. Fine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post plasma ashing wafer cleaning formulation
    Publication number: 20020068685
    Abstract: A semiconductor wafer cleaning formulation for use in post plasma ashing semiconductor fabrication comprising at least one organic chelating agent and at least one polar solvent, wherein the chelating agent and polar solvent are in sufficient amounts to effectively remove inorganic compound residue from a semiconductor wafer. Preferably, the chelating agent is selected from the group consisting of 2,4-Pentanedione, Malonic acid, Oxalic acid, p-Toluenesulfonic acid, and Trifluoroacetic acid; and the polar solvent is selected from the group consisting of Water, Ethylene glycol, N-Methylpyrrolidone (NMP), Gamma butyrolactone (BLO), Cyclohexylpyrrolidone (CHP), Sulfolane, 1,4-Butanediol, and Butyl carbitol.
    Type: Application
    Filed: September 17, 2001
    Publication date: June 6, 2002
    Inventors: William A. Wojtczak, Ma. Fatima Seijo, Thomas J. Kloffenstein, Daniel N. Fine, Stephen Q. Fine