Patents by Inventor Stephen R. Marschner

Stephen R. Marschner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10403404
    Abstract: A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: September 3, 2019
    Assignees: Disney Enterprises, Inc., ETH Zurich (Eidgenoessiche Technische Hochschule Zurich)
    Inventors: Bernd Bickel, Peter Kaufmann, Bernhard Thomaszewski, Derek Edward Bradley, Philip John Jackson, Stephen R. Marschner, Wojciech Matusik, Markus Gross, Thabo Dominik Beeler
  • Publication number: 20150317451
    Abstract: A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.
    Type: Application
    Filed: July 13, 2015
    Publication date: November 5, 2015
    Inventors: Bernd BICKEL, Peter KAUFMAN, Bernhard THOMASZEWSKI, Derek Edward BRADLEY, Philip John JACKSON, Stephen R. MARSCHNER, Wojciech MATSUIK, Markus GROSS, Thabo Dominik BEELER
  • Patent number: 9082222
    Abstract: A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: July 14, 2015
    Assignees: DISNEY ENTERPRISES, INC., ETH ZURICH (EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZURICH)
    Inventors: Bernd Bickel, Peter Kaufmann, Bernhard Thomaszewski, Derek Edward Bradley, Philip John Jackson, Stephen R. Marschner, Wojciech Matusik, Markus Gross, Thabo Dominik Beeler
  • Publication number: 20120185218
    Abstract: A computer-implemented method is provided for physical face cloning to generate a synthetic skin. Rather than attempt to reproduce the mechanical properties of biological tissue, an output-oriented approach is utilized that models the synthetic skin as an elastic material with isotropic and homogeneous properties (e.g., silicone rubber). The method includes capturing a plurality of expressive poses from a human subject and generating a computational model based on one or more material parameters of a material. In one embodiment, the computational model is a compressible neo-Hookean material model configured to simulate deformation behavior of the synthetic skin. The method further includes optimizing a shape geometry of the synthetic skin based on the computational model and the captured expressive poses. An optimization process is provided that varies the thickness of the synthetic skin based on a minimization of an elastic energy with respect to rest state positions of the synthetic skin.
    Type: Application
    Filed: October 18, 2011
    Publication date: July 19, 2012
    Applicant: DISNEY ENTERPRISES, INC.
    Inventors: Bernd Bickel, Peter Kaufmann, Bernhard Thomaszewski, Derek Edward Bradley, Philip John Jackson, Stephen R. Marschner, Wojciech Matusik, Markus Gross, Thabo Dominik Beeler