Patents by Inventor Stephen R. McCormack

Stephen R. McCormack has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shallow trench isolation in integrated circuits
    Patent number: 5677564
    Abstract: The invention concerns fabrication of oxide-filled isolation trenches in integrated circuits. The invention etches a network of trenches in the surface of a uniformly doped wafer which has experienced no substantial processing steps. Such a wafer will have little, if any, surface damage. Such a wafer will etch to the same depth everywhere, because two major factors which affect etching rate are (a) surface damage and (b) doping non-uniformity, and these factors are absent. The trenches are then filled with oxide. They define islands upon which devices (such as transistors) may now be fabricated.
    Type: Grant
    Filed: August 21, 1996
    Date of Patent: October 14, 1997
    Assignees: AT&T Global Information Solutions Company, Hyundai Electronics America, Symbios Logic Inc.
    Inventors: Stephen R. McCormack, Christine H. Chiacchia, Patrick J. Kelleher