Patents by Inventor Stephen Rishton

Stephen Rishton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Technique for writing with a raster scanned beam
    Patent number: 6828570
    Abstract: Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: December 7, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Lee H. Veneklasen, Stephen Rishton, Stacey J. Winter, Volker Boegli, Huei Mei Kao
  • Technique for writing with a raster scanned beam
    Publication number: 20030183782
    Abstract: Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.
    Type: Application
    Filed: April 1, 2002
    Publication date: October 2, 2003
    Inventors: Lee H. Veneklasen, Mary B. Veneklasen, Stephen Rishton, Stacey J. Winter, Volker Boegli, Huei Mei Kao