Abstract: A stack of alternating layers comprising first epitaxial semiconductor layers and second epitaxial semiconductor layers is formed over a single crystalline substrate. The first and second epitaxial semiconductor layers are in epitaxial alignment with a crystal structure of the single crystalline substrate. The first epitaxial semiconductor layers include a first single crystalline semiconductor material, and the second epitaxial semiconductor layers include a second single crystalline semiconductor material that is different from the first single crystalline semiconductor material. A backside contact opening is formed through the stack, and backside cavities are formed by removing the first epitaxial semiconductor layers selective to the second epitaxial semiconductor layers. A stack of alternating layers including insulating layers and electrically conductive layers is formed. Each insulating layer contains a dielectric material portion deposited within a respective backside cavity.

Abstract: Dielectric degradation and electrical shorts due to fluorine radical generation from metallic electrically conductive lines in a three-dimensional memory device can be reduced by forming composite electrically conductive layers and/or using of a metal oxide material for an insulating spacer for backside contact trenches. Each composite electrically conductive layer includes a doped semiconductor material portion in proximity to memory stack structures and a metallic material portion in proximity to a backside contact trench. Fluorine generated from the metallic material layers can escape readily through the backside contact trench. The semiconductor material portions can reduce mechanical stress.

Abstract: A memory opening can be formed through a multiple tier structure. Each tier structure includes an alternating stack of sacrificial material layers and insulating layers. After formation of a dielectric oxide layer, the memory opening is filled with a sacrificial memory opening fill structure. The sacrificial material layers are removed selective to the insulating layers and the dielectric oxide layer to form backside recesses. Physically exposed portions of the dielectric oxide layer are removed. A backside blocking dielectric and electrically conductive layers are formed in the backside recesses.

Abstract: A memory opening can be formed through a multiple tier structure. Each tier structure includes an alternating stack of sacrificial material layers and insulating layers. After formation of a dielectric oxide layer, the memory opening is filled with a sacrificial memory opening fill structure. The sacrificial material layers are removed selective to the insulating layers and the dielectric oxide layer to form backside recesses. Physically exposed portions of the dielectric oxide layer are removed. A backside blocking dielectric and electrically conductive layers are formed in the backside recesses. Subsequently, the sacrificial memory opening fill structure is replaced with a memory stack structure including a plurality of charge storage regions and a semiconductor channel. Hydrogen or deuterium from a dielectric core may then be outdiffused into the semiconductor channel.

Abstract: A monolithic three-dimensional memory device includes a first memory block containing a plurality of memory sub-blocks located on a substrate. Each memory sub-block includes a set of memory stack structures and a portion of alternating layers laterally surrounding the set of memory stack structures. The alternating layers include insulating layers and electrically conductive layers. A first portion of a neighboring pair of memory sub-blocks is laterally spaced from each other along a first horizontal direction by a backside contact via structure. A subset of the alternating layers contiguously extends between a second portion of the neighboring pair of memory sub-blocks through a gap in a bridge region between two portions of the backside contact via structure that are laterally spaced apart along a second horizontal direction to provide a connecting portion between the neighboring pair of memory sub-blocks.

Abstract: Peripheral devices for a three-dimensional memory device can be formed over an array of memory stack structures to increase areal efficiency of a semiconductor chip. First contact via structures and first metal lines are formed over an array of memory stack structures and an alternating stack of insulating layers and electrically conductive layers. A semiconductor material layer including a single crystalline semiconductor material or a polycrystalline semiconductor material is formed over first metal lines. After formation of semiconductor devices on or in the semiconductor material layer, metal interconnect structures including second metal lines and additional conductive via structures are formed to electrically connect nodes of the semiconductor devices to respective first metal lines and to memory devices underneath.

Abstract: Dielectric degradation and electrical shorts due to fluorine radical generation from metallic electrically conductive lines in a three-dimensional memory device can be reduced by forming composite electrically conductive layers and/or use of a metal oxide material for an insulating spacer for backside contact trenches. Each composite electrically conductive layer includes a doped semiconductor material portion in proximity to memory stack structures and a metallic material portion in proximity to a backside contact trench. Fluorine generated from the metallic material layers can escape readily through the backside contact trench. The semiconductor material portions can reduce mechanical stress.

Abstract: A method of fabricating a memory device is provided. The method includes forming a first alternating stack of insulator layers and spacer material layers over a semiconductor substrate, etching the first alternating stack to expose a single crystalline semiconductor material, forming a first epitaxial semiconductor pedestal on the single crystalline semiconductor material, such that the first epitaxial semiconductor pedestal is in epitaxial alignment with the single crystalline semiconductor material, forming an array of memory stack structures through the first alternating stack, and forming at least one semiconductor device over the first epitaxial semiconductor pedestal.

Abstract: A stack of alternating layers comprising first epitaxial semiconductor layers and second epitaxial semiconductor layers is formed over a single crystalline substrate. The first and second epitaxial semiconductor layers are in epitaxial alignment with a crystal structure of the single crystalline substrate. The first epitaxial semiconductor layers include a first single crystalline semiconductor material, and the second epitaxial semiconductor layers include a second single crystalline semiconductor material that is different from the first single crystalline semiconductor material. A backside contact opening is formed through the stack, and backside cavities are formed by removing the first epitaxial semiconductor layers selective to the second epitaxial semiconductor layers. A stack of alternating layers including insulating layers and electrically conductive layers is formed. Each insulating layer contains a dielectric material portion deposited within a respective backside cavity.