Patents by Inventor Stephen Yu-Hong Lau

Stephen Yu-Hong Lau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11177131
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: November 16, 2021
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 10221484
    Abstract: A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: March 5, 2019
    Assignee: Novellus Systems, Inc.
    Inventors: Henner W. Meinhold, Dan M. Doble, Stephen Yu-Hong Lau, Vince Wilson, Easwar Srinivasan
  • Patent number: 10121682
    Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: November 6, 2018
    Assignee: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20180315604
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: July 6, 2018
    Publication date: November 1, 2018
    Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 10020197
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: July 10, 2018
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20170009344
    Abstract: A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.
    Type: Application
    Filed: September 23, 2016
    Publication date: January 12, 2017
    Inventors: Henner W. Meinhold, Dan M. Doble, Stephen Yu-Hong Lau, Vince Wilson, Easwar Srinivasan
  • Patent number: 9384959
    Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: July 5, 2016
    Assignee: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20150255285
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: May 20, 2015
    Publication date: September 10, 2015
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 9073100
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: July 7, 2015
    Assignee: Novellus Systems, Inc.
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 9028765
    Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: May 12, 2015
    Assignee: Lam Research Corporation
    Inventors: Lisa Marie Gytri, Stephen Yu-Hong Lau, James Forest Lee
  • Publication number: 20150056108
    Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.
    Type: Application
    Filed: August 23, 2013
    Publication date: February 26, 2015
    Applicant: Lam Research Corporation
    Inventors: Lisa Marie Gytri, Stephen Yu-Hong Lau, James Forest Lee
  • Publication number: 20140230861
    Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.
    Type: Application
    Filed: April 24, 2014
    Publication date: August 21, 2014
    Applicant: Novellus Systems, Inc.
    Inventors: Eugene SMARGIASSI, Stephen Yu-Hong LAU, George D. KAMIAN, Ming XI
  • Patent number: 8734663
    Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: May 27, 2014
    Assignee: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20130298940
    Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.
    Type: Application
    Filed: July 17, 2013
    Publication date: November 14, 2013
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20130284087
    Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.
    Type: Application
    Filed: February 25, 2013
    Publication date: October 31, 2013
    Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 8518210
    Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: August 27, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Publication number: 20130160946
    Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.
    Type: Application
    Filed: July 31, 2012
    Publication date: June 27, 2013
    Applicant: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
  • Patent number: 8282768
    Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Methods and systems using a purge ring are particularly useful for purging and cleaning porogens from a UV curing chamber. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: October 9, 2012
    Assignee: Novellus Systems, Inc.
    Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi