Patents by Inventor Stephen Yu-Hong Lau
Stephen Yu-Hong Lau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11177131Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: GrantFiled: July 6, 2018Date of Patent: November 16, 2021Assignee: Novellus Systems, Inc.Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 10221484Abstract: A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.Type: GrantFiled: September 23, 2016Date of Patent: March 5, 2019Assignee: Novellus Systems, Inc.Inventors: Henner W. Meinhold, Dan M. Doble, Stephen Yu-Hong Lau, Vince Wilson, Easwar Srinivasan
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Patent number: 10121682Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.Type: GrantFiled: June 3, 2016Date of Patent: November 6, 2018Assignee: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20180315604Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: ApplicationFiled: July 6, 2018Publication date: November 1, 2018Inventors: Lisa Marie Gytri, Jeff Gordon, James Forest Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 10020197Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: GrantFiled: May 20, 2015Date of Patent: July 10, 2018Assignee: Novellus Systems, Inc.Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20170009344Abstract: A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.Type: ApplicationFiled: September 23, 2016Publication date: January 12, 2017Inventors: Henner W. Meinhold, Dan M. Doble, Stephen Yu-Hong Lau, Vince Wilson, Easwar Srinivasan
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Patent number: 9384959Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.Type: GrantFiled: April 24, 2014Date of Patent: July 5, 2016Assignee: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20150255285Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: ApplicationFiled: May 20, 2015Publication date: September 10, 2015Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 9073100Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: GrantFiled: February 25, 2013Date of Patent: July 7, 2015Assignee: Novellus Systems, Inc.Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 9028765Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.Type: GrantFiled: August 23, 2013Date of Patent: May 12, 2015Assignee: Lam Research CorporationInventors: Lisa Marie Gytri, Stephen Yu-Hong Lau, James Forest Lee
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Publication number: 20150056108Abstract: Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.Type: ApplicationFiled: August 23, 2013Publication date: February 26, 2015Applicant: Lam Research CorporationInventors: Lisa Marie Gytri, Stephen Yu-Hong Lau, James Forest Lee
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Publication number: 20140230861Abstract: A purge ring for providing a gas to a wafer processing chamber includes an inlet ring wall defining a ring hole space. An outer perimeter of the inlet ring wall is elliptical. An outer perimeter of the ring hole space is circular. The inlet ring wall is a continuous structure surrounding the ring hole space. An inlet baffle formed within the inlet ring wall surrounds at least 180 degrees of the outer perimeter of the ring hole space. An inlet plenum arranged in a first end of the inlet ring wall provides the gas to the ring hole space through the inlet baffle. An exhaust channel is formed within the inlet ring wall in a second end of the inlet ring wall. An exhaust outlet hole arranged in the second end of the inlet ring wall exhausts the gas out of the ring hole space via the exhaust channel.Type: ApplicationFiled: April 24, 2014Publication date: August 21, 2014Applicant: Novellus Systems, Inc.Inventors: Eugene SMARGIASSI, Stephen Yu-Hong LAU, George D. KAMIAN, Ming XI
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Patent number: 8734663Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.Type: GrantFiled: July 17, 2013Date of Patent: May 27, 2014Assignee: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20130298940Abstract: A method for removing species from a substrate includes arranging a purge ring in a chamber proximate to a pedestal. The purge ring includes an inlet portion and an exhaust portion. The inlet portion defines an inlet plenum and an inlet baffle. The inlet baffle includes a continuous slit that is substantially continuous around a peripheral arc not less than about 270°. The exhaust portion includes an exhaust channel that is located substantially opposite the inlet baffle. The method further includes supplying ozone to the inlet plenum; at least partially defining a ring hole space having a periphery using the inlet portion and the exhaust portion; conveying gas from the inlet plenum into the ring hole space using the inlet baffle; conveying gas and other matter out of a purge space using the exhaust portion; and inhibiting deposition of material evolved from the substrate during curing using the purge ring.Type: ApplicationFiled: July 17, 2013Publication date: November 14, 2013Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20130284087Abstract: Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.Type: ApplicationFiled: February 25, 2013Publication date: October 31, 2013Inventors: Lisa Gytri, Jeff Gordon, James Lee, Carmen Balderrama, Joseph Brett Harris, Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 8518210Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.Type: GrantFiled: July 31, 2012Date of Patent: August 27, 2013Assignee: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Publication number: 20130160946Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.Type: ApplicationFiled: July 31, 2012Publication date: June 27, 2013Applicant: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi
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Patent number: 8282768Abstract: An apparatus for purging a space in a processing chamber comprises a source of a purge gas; an inlet portion of a purge ring; an inlet baffle located in the inlet portion and fluidically connected to the source of purge gas; and an exhaust portion of the purge ring. The inlet portion and the exhaust portion define a ring hole space having a 360° periphery. The inlet baffle preferably surrounds not less than 180° of said periphery. The inlet baffle is operable to convey purge gas into the ring hole space. The exhaust portion is operable to convey purge gas and other matter out of the ring hole space. Cleaning of the purge ring and other structures in a processing chamber is conducted by flowing a cleaning gas through the inlet baffle. Methods and systems using a purge ring are particularly useful for purging and cleaning porogens from a UV curing chamber. Some embodiments include a gas inlet plenum and an exhaust channel but not a purge ring.Type: GrantFiled: September 18, 2009Date of Patent: October 9, 2012Assignee: Novellus Systems, Inc.Inventors: Eugene Smargiassi, Stephen Yu-Hong Lau, George D. Kamian, Ming Xi