Patents by Inventor Steve Ghanayeim

Steve Ghanayeim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050136684
    Abstract: A variety of techniques may be employed, separately or in combination, to improve the gap-filling performance of a dielectric material formed by chemical vapor deposition (CVD). In one approach, a first dielectric layer is deposited using sub-atmospheric chemical vapor deposition (SACVD), followed by a second dielectric layer deposited by high density plasma chemical vapor deposition (HDP-CVD) or plasma-enhanced chemical vapor deposition (PECVD). In another approach, a SACVD dielectric layer is deposited in the presence of reactive ionic species flowed from a remote plasma chamber into the processing chamber, which performs etching during the deposition process. In still another approach, high aspect trenches may be filled utilizing SACVD in combination with oxide layers deposited at high temperatures.
    Type: Application
    Filed: December 23, 2003
    Publication date: June 23, 2005
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Kevin Mukai, Kimberly Branshaw, Zheng Yuan, Xinyun Xia, Xiaolin Chen, Dongqing Li, M. Karim, Van Ton, Cary Ching, Steve Ghanayeim, Nitin Ingle