Abstract: An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Abstract: A system and method of real estate inventory management includes providing, to a client system, data identifying one or more units of real estate that are available for sale; receiving a reservation request identifying a unit that is available for sale; receiving, at the server system, purchasing data for a reservation fee for the identified unit of real estate; processing a deposit in the amount of the reservation fee for the identified of real estate using the purchasing data; verifying that the deposit for the identified unit record processed; and updating the reservation status of the identified unit of real estate to indicate that the unit of real estate is not available for sale.

Abstract: A temperature control system and methods that remove dust or debris from inside an electrical equipment chassis are provided. One or more fans are placed in or near the exterior of the chassis. The fans are operated either in reverse, forward, pulsing, or reverse pulsing modes to create turbulent air flow through the chassis. The change in air flow pattern helps dislodge dust and particles. Once airborne, the fans can exhaust the dust and particles. Further, some embodiments provide vanes or other elements to further direct air flow. The temperature control system can be used in any electrical equipment that is ventilated with fans. The temperature control system provides the advantage of a low cost and efficient method for ensuring that dust does not accumulate on components within an enclosure.

Abstract: A temperature control system and methods that remove dust or debris from inside an electrical equipment chassis are provided. One or more fans are placed in or near the exterior of the chassis. The fans are operated either in reverse, forward, pulsing, or reverse pulsing modes to create turbulent air flow through the chassis. The change in air flow pattern helps dislodge dust and particles. Once airborne, the fans can exhaust the dust and particles. Further, some embodiments provide vanes or other elements to further direct air flow. The temperature control system can be used in any electrical equipment that is ventilated with fans. The temperature control system provides the advantage of a low cost and efficient method for ensuring that dust does not accumulate on components within an enclosure.

Abstract: The shell of an electronic handheld device is adapted for easy and repeated—even frequent—assembly with and disassembly from the electronics, and the shell is washable, preferably in a dishwasher. Preferably, the shell comprises a plurality of parts that can be easily and repeatedly assembled and disassembled by hand without use of tools. For example, the parts of a telephone handset shell are made to be easily snapped together around, and unsnapped from, the handset's electronics, thereby enabling the shells of the handsets of telephones to be washed to have this function performed by unskilled personnel.

Abstract: An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Abstract: An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Abstract: An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Abstract: A method of cleaning process residues formed on surfaces in a chamber during processing of a substrate in the chamber includes first and second steps. In a first cleaning step, a first energized cleaning gas having a first chlorine-containing gas and oxygen is provided in the chamber and then exhausted. In a second cleaning step, a second energized cleaning gas having a second chlorine-containing gas and oxygen is provided in the chamber and then exhausted.

Abstract: An RF plasma etch reactor having an etch chamber with electrically conductive walls and a protective layer forming the portion of the walls facing the interior of the chamber. The protective layer prevents sputtering of material from the chamber walls by a plasma formed within the chamber. The etch reactor also has an inductive coil antenna disposed within the etch chamber which is used to generate the plasma by inductive coupling. Like the chamber walls, the inductive coil antenna is constructed to prevent sputtering of the material making up the antenna by the plasma. The coil antenna can take on any configuration (e.g. location, shape, orientation) that is necessary to achieve a desired power deposition pattern within the chamber. Examples of potential coil antenna configurations for achieving the desired power deposition pattern include constructing the coil antenna with a unitary or a segmented structure.