Patents by Inventor Steve S. Miura

Steve S. Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
    Patent number: 5362599
    Abstract: Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.
    Type: Grant
    Filed: November 14, 1991
    Date of Patent: November 8, 1994
    Assignee: International Business Machines Corporations
    Inventors: Christopher J. Knors, Steve S. Miura, Melvin W. Montgomery, Wayne M. Moreau, Randolph J. Smith
  • Silicon containing positive resist for DUV lithography
    Patent number: 5338818
    Abstract: A method of synthesizing a silicon-containing positive resist for use as a imaging layer in DUV, x-ray, or e-beam lithography is disclosed. The resist contains arylsilsesquioxane polymers with acid sensitive pendant groups as dissolution inhibitors and a photoacid generator.
    Type: Grant
    Filed: September 10, 1992
    Date of Patent: August 16, 1994
    Assignee: International Business Machines Corporation
    Inventors: William R. Brunsvold, Premlatha Jagannathan, Steve S. Miura, Melvin W. Montgomery, Harbans S. Sachdev, Ratnam Sooriyakumaran
  • Top coat for acid catalyzed resists
    Patent number: 5240812
    Abstract: A protective material for use as an overcoating film for acid catalyzed resist compositions comprising a polymeric film forming compound, the films of which are impermeable to vapors of organic and inorganic bases.
    Type: Grant
    Filed: November 18, 1991
    Date of Patent: August 31, 1993
    Assignee: International Business Machines Corporation
    Inventors: Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons, Steve S. Miura, Wayne M. Moreau, Harbans S. Sachdev, Robert L. Wood