Patents by Inventor Steven A. Peterman

Steven A. Peterman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7914056
    Abstract: A removing utensil for solid waste deposited by a small animal comprised of a support; a plurality of elongated members that extend from the support that form a removing surface; a pair of elongated members having distal sections that obliquely face away from positioned superior to the removing surface whereby solid waste is funneled unto the removing surface; a handle assembly comprised of a handle member and a projector of a beam of light and a bracket that extends from the support having first leg in the plane of the removing surface and second leg that connects to the handle assembly which is shaped so that a projected beam of light illuminates the removing surface and an area forward.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: March 29, 2011
    Inventor: Steven A. Peterman
  • Patent number: 7878093
    Abstract: A rotator socket for use with a handheld power drill suitable to install a cup hook, the cup hook characterized by a rounded hook portion having wideness and a semi-spherical flange, comprised of a shank; a body; a slot; a depression and a resilient member.
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: February 1, 2011
    Inventor: Steven A. Peterman
  • Patent number: 4855252
    Abstract: A process for making metal contacts and interconnection lines which are self-aligned to each other is disclosed. After semiconductor devices are formed and an insulating/planarizing layer is deposited, a layer of polyimide is deposited. A pattern of trenches into which the metal interconnection lines will be deposited is formed in the polyimide layer. Next, a pattern of contacts to the underlying semiconductor devices is formed in a photoresist layer. This pattern of contacts is subsequently etched into the insulating/planarizing layer. Since both the patterned photoresist layer and the patterned polyimide layer are used as etch masks, the contact windows through the insulating/planarizing layer and the trenches in the polyimide layer will be aligned with respect to each other. After metal deposition, the metal contacts and interconnection lines will be self-aligned.
    Type: Grant
    Filed: August 22, 1988
    Date of Patent: August 8, 1989
    Assignee: International Business Machines Corporation
    Inventors: Steven Peterman, David Stanasolovich