Patents by Inventor Steven Aihua Chen

Steven Aihua Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-zone resistive heater
    Patent number: 6646235
    Abstract: A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: November 11, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Steven Aihua Chen, Henry Ho, Michael X. Yang, Bruce W. Peuse, Karl Littau, Yu Chang
  • Multi-zone resistive heater
    Publication number: 20020125239
    Abstract: A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater.
    Type: Application
    Filed: October 19, 2001
    Publication date: September 12, 2002
    Inventors: Steven Aihua Chen, Henry Ho, Michael X. Yang, Bruce W. Peuse, Karl Littau, Yu Chang
  • Multi-zone resistive heater
    Patent number: 6423949
    Abstract: A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: July 23, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Steven Aihua Chen, Henry Ho, Michael X. Yang, Bruce W. Peuse, Karl Littau, Yu Chang
  • High temperature resistive heater for a process chamber
    Patent number: 6066836
    Abstract: A resistive heating structure for a processing apparatus such as a chemical vapor deposition chamber. The system includes a resistive heating substrate holder including a support surface and a support shaft, the holder being comprised of a first material. The support surface includes a resistive heating element. The support shaft has a given length, and through bores for allowing a thermocouple to engage the support surface and electrical conductors to couple to the resistive heating element in the support surface. A metallic mounting structure is coupled to the support shaft and secured to the process apparatus to create a sealed environment within the holder and mounting structure to protect the electrical leads and thermocouple from the process environment.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: May 23, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Steven Aihua Chen, Henry Ho, Mei Chang, Ming Xi, Chen-An Chen, Chiliang Chen
  • High temperature susceptor
    Patent number: 5837058
    Abstract: A susceptor with improved resistance to thermal cycling and chemical attack between processing and cleaning cycles. The susceptor comprises a top surface is surrounded by a lip, the lip having a beveled inner side, a top side, an outer side, a first rounded edge between the top side and the outer side, a second rounded edge between the top side and the inner side, and a third rounded edge between the inner side and the top surface. The susceptor comprises a body of graphite covered by a coating of aluminum nitride.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: November 17, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Steven Aihua Chen, Ming Xi, Ruiping Wang