Abstract: A process for removing organic electroluminescent residues from a substrate is described herein. The process includes the steps of providing a process gas comprising a fluorine-containing gas, optionally an oxygen-containing gas, and optionally an additive gas; activating the process gas in a remote chamber using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the organic electroluminescent residue from the surface.

Abstract: An on-line halogen analyzer system and method of use for semiconductor processing effluent monitoring. The system includes sampling the effluent stream into an absorption cell, and passing UV-Visible light through the effluent sample in the cell. After passing through the sample the light is collected by a photo detector for real-time wavelength-selective absorption analysis. The system provides simultaneous determination of the concentrations of multiple halogen gases (e.g. F2, Cl2, Br2, and I2) in semiconductor processing effluent streams. The invention can be used for chemical vapor deposition (CVD) chamber cleaning endpoint determination and to improve fluorine utilization efficiency in remote plasma downstream CVD chamber cleaning processes.

Abstract: An on-line halogen analyzer system and method of use for semiconductor processing effluent monitoring. The system includes sampling the effluent stream into an absorption cell, and passing UV-Visible light through the effluent sample in the cell. After passing through the sample the light is collected by a photo detector for real-time wavelength-selective absorption analysis. The system provides simultaneous determination of the concentrations of multiple halogen gases (e.g. F2, Cl2, Br2, and I2) in semiconductor processing effluent streams. The invention can be used for chemical vapor deposition (CVD) chamber cleaning endpoint determination and to improve fluorine utilization efficiency in remote plasma downstream CVD chamber cleaning processes.

Abstract: A method for delivering a gas having a proton affinity of less than 866 kJ/mol is disclosed. A support including at least one polymer sufficiently acidic to protonate the gas is contacted with the gas to protonate the gas. The protonated gas condenses to form a solid salt which is sorbed by the support. The gas is dispensed by deprotonating the sorbed solid salt to regenerate said gas. The at least one polymer of the support has a first Hammett acidity value greater than a second Hammett acidity value of a conjugate acid of the gas. Also provided is an apparatus for performing the method. The invention is especially useful for storing, transporting and delivering hazardous gases, such as arsine and phosphine. The polymer can be polymeric sulfonic acids, polymeric perfluoroalkylsulfonic acids, fluorinated sulfonic acid polymers, cross-linked sulfonated polystyrene-divinylbenzene macroreticular copolymers, carboxylic acid polymers, halogenated carboxylic acid functionalized polymers and mixtures thereof.