Abstract: Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.

Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam.

Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam.

Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam.

Abstract: A system for delivering a drop of liquid to an eye of a subject, wherein the instrument has a receiver to receive a liquid to be delivered to the eye of the subject, a transfer portion to receive the liquid from the receiver to advance a drop of the liquid by gravity and capillary action through a capillary tube to a lower discharge outlet whereat the drop of liquid breaks away and drops from the capillary tube, and a lid retractor supported adjacent to the discharge outlet of the capillary tube, for being pressed against the lower lid of the subject to form a cul-de-sac at the lower lid. The lower discharge outlet of the capillary tube is positioned adjacent to and above the lid retractor in a position to deposit the drop of liquid into the cul-de-sac.

Abstract: An improved simulator for an analytical instrument that provides the student with an experience similar to that of operating the actual instrument. In one preferred embodiment, the invention combines real functionality and simulated functionality where at least one function of the analytical instrument is real. In another preferred embodiment, the invention combines a functional first instrument along with a simulation of a second instrument, the simulation including both hardware with limited functionality and software that simulates the output of a functional instrument to create a teaching aid for use in classrooms and teaching laboratories.

Abstract: The present invention generally relates to a locking apparatus adapted to interface with a valve and to selectively secure the valve in an open or closed position. More specifically, a valve handle lock is provided which is tamper resistant and is generally capable of use with valves produced by many manufacturers. The present invention further includes a locking mechanism that shrouds a portion of the valve handle attachment hardware and which can be used in conjunction with a typical padlock or other type of securement mechanism.

Abstract: A system for delivering a drop of liquid to an eye of a subject, wherein the instrument has a receiver to receive a liquid to be delivered to the eye of the subject, a transfer portion to receive the liquid from the receiver to advance a drop of the liquid by gravity and capillary action through a capillary tube to a lower discharge outlet whereat the drop of liquid breaks away and drops from the capillary tube, and a lid retractor supported adjacent to the discharge outlet of the capillary tube, for being pressed against the lower lid of the subject to form a cul-de-sac at the lower lid. The lower discharge outlet of the capillary tube is positioned adjacent to and above the lid retractor in a position to deposit the drop of liquid into the cul-de-sac.

Abstract: Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.

Abstract: The present invention generally relates to a locking apparatus adapted to interface with a valve and to selectively secure the valve in an open or closed position. More specifically, a valve handle lock is provided which is tamper resistant and is generally capable of use with valves produced by many manufacturers. The present invention further includes a locking mechanism that shrouds a portion of the valve handle attachment hardware and which can be used in conjunction with a typical padlock or other type of securement mechanism.

Abstract: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam.

Abstract: An individual yarn feeding apparatus (10) for compensating for variations in the feed rate of individual yarn threads due to the lateral shifting of needle bars in various selected pile heights between tufts. The individual yarn feeding apparatus (10) is positioned between the yarn beam and the needle bar of a conventional tufting machine. The apparatus (10) includes a support arm (12) carried by the tufting machine, at least one thread guide (14) disposed proximate a first end (16) of the support arm (12), and at least one feed rate control device (20) received on the support arm (12). The thread guide (14) separates the individual yarn threads as they pass from the yarn beam, through the apparatus (10) and to the needle bar. The feed rate control device (20) enables the definition of an accent yarn feed path (22) and a base yarn feed path (24).

Abstract: A tangential drive needle bar shifter for tufting machines. The tangential drive needle bar shifter includes a computer system for creating and storing selected carpet patterns and for controlling the operation of at least one motor which drives the needle bar. The motor includes an output shaft which rotates through a selected degree of rotation in a selected direction. At least one belt is driven by the rotation of the shaft to create lateral displacement of an engagement device is secured thereto. Displacement of the engagement device ultimately creates a shift of the needle bar. As the motor is actuated, the needle bar is shifted a distance proportional to the degree of rotation of the output shaft. A position locking mechanism, or indexer, is provided for preventing the needle bar from shifting farther then required and thus preventing the needles from colliding with the corresponding hooks.

Abstract: An in-line needle bar arrangement for tufting machines (10) for tufting a selected fabric. A pair of needle bars (12A,B) are provided with registered faces (20) configured to engage one another such that the needles (14) carried thereby are positioned to define a single row of needles (14). Each one of the needles (14) is substantially similar to each of the others such that only one configuration of needle (14) is required. A plurality of filaments (16) are provided, one each for one each of the plurality of needles (14). Each filament (16) is engaged by one of at least two feed control rollers (18). Each of the rollers (18) is controlled independently from the other in order to accomplish different feed rates by each. By varying the feed rate of the yarn (16), the pile height is proportionately varied, thus varying the pile height of the respective tufts.