Abstract: An apparatus includes a chamber having a process zone. The chamber is configured to contain a substrate, an etching substance, and an antenna. The antenna is configured to activate the etching substance. The substrate includes a material formulated to be etched by the etching substance when the etching substance is activated. The apparatus also includes a transfer mechanism. The transfer mechanism is configured to move the substrate from a first position to a second position. A first portion of the substrate is disposed within the process zone and a second portion of the substrate is disposed outside the process zone when the substrate is in its first position. The first portion of the substrate is disposed outside the process zone and the second portion of the substrate is disposed inside the process zone when the substrate is in its second position. The size and geometry of the antenna can be chosen to allow the etching of a grounded substrate.

Abstract: A casing-less down hole sampling system for acquiring a subsurface sample for analysis using an inductively coupled plasma system is disclosed. The system includes a probe which is pushed into the formation to be analyzed using a hydraulic ram system. The probe includes a detachable tip member which has a soil point mad a barb, with the soil point aiding the penetration of the earth, and the barb causing the tip member to disengage from the probe and remain in the formation when the probe is pulled up. The probe is forced into the formation to be tested, and then pulled up slightly, to disengage the tip member and expose a column of the subsurface formation to be tested. An instrumentation tube mounted in the probe is then extended outward from the probe to longitudinally extend into the exposed column. A balloon seal mounted on the end of the instrumentation tube allows the bottom of the column to be sealed.

Abstract: A method and apparatus for in situ addition calibration of an inductively coupled plasma atomic emission spectrometer or mass spectrometer using a precision gas metering valve to introduce a volatile calibration gas of an element of interest directly into an aerosol particle stream. The present situ calibration technique is suitable for various remote, on-site sampling systems such as laser ablation or nebulization.

Abstract: Thin film resonators are prepared by an improved process involving coating a patterned wafer with a sol-gel derived tantalum (V) oxide passivating film so that the circuitry can be protected from etching chemicals during the etching of vias through the back of the silicon wafer.