Patents by Inventor Steven D. Marcus
Steven D. Marcus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12074010Abstract: Methods and apparatus for coating processing reactor component parts are provided herein. In some embodiments, a part coating reactor includes: a lower body and a lid assembly that together define and enclose an interior volume; one or more heaters disposed in the lid assembly; one or more coolant channels disposed in the lid assembly to flow a heat transfer medium therethrough; a plurality of gas passages disposed through the lid assembly to facilitate providing one or more gases to the interior volume, wherein the plurality of gas passages include a plurality of fluidly independent plenums disposed in the lid assembly; and one or more mounting brackets to facilitate coupling a workpiece to the lid assembly.Type: GrantFiled: September 9, 2021Date of Patent: August 27, 2024Assignee: APPLIED MATERIALS, INC.Inventors: Michael R. Rice, Hanish Kumar Panavalappil Kumarankutty, Steven D. Marcus, Kirubanandan Naina Shanmugam, Sriharsha Dharmapura Sathyanarayanamurthy, Madhukar Krishna, Shivaprakash Padadayya Hiremath, Senthil Kumar Nattamai Subramanian, Sankar Menon Cherubala Pathayapura
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Patent number: 11946140Abstract: Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of the plurality of apertures. The systems may define a plurality of isolators. An isolator may be positioned between each lid stack and a corresponding aperture of the plurality of apertures. The systems may include a plurality of annular spacers. An annular spacer of the plurality of annular spacers may be positioned between each isolator and a corresponding lid stack of the plurality of lids stacks. The systems may include a plurality of manifolds. A manifold may be seated within an interior of each annular spacer of the plurality of annular spacers.Type: GrantFiled: March 26, 2021Date of Patent: April 2, 2024Assignee: Applied Materials, Inc.Inventors: Anantha K. Subramani, Seyyed Abdolreza Fazeli, Yang Guo, Ramcharan Sundar, Arun Kumar Kotrappa, Steven Mosbrucker, Steven D. Marcus, Xinhai Han, Kesong Hu, Tianyang Li, Philip A. Kraus
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Patent number: 11932938Abstract: Disclosed is a coated chamber component comprising a body having a reduced metal surface such that the reduced metal surface has less metal oxide as compared to an amount of metal oxide on a metal surface that has not been reduced. The metal surface may be reduced by pulsing a reducing alcohol thereon. The reduced metal surface may be coated with a corrosion resistant film that may be deposited onto the reduced metal surface by a dry atomic layer deposition process.Type: GrantFiled: July 22, 2020Date of Patent: March 19, 2024Assignee: Applied Materials, Inc.Inventors: Lisa J. Enman, Steven D. Marcus, Mark J. Saly, Lei Zhou
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Publication number: 20240003003Abstract: Disclosed is a coated chamber component comprising a body having a reduced metal surface such that the reduced metal surface has less metal oxide as compared to an amount of metal oxide on a metal surface that has not been reduced. The metal surface may be reduced by pulsing a reducing alcohol thereon. The reduced metal surface may be coated with a corrosion resistant film that may be deposited onto the reduced metal surface by a dry atomic layer deposition process.Type: ApplicationFiled: September 14, 2023Publication date: January 4, 2024Inventors: Lisa J. Enman, Steven D. Marcus, Mark J. Saly, Lei Zhou
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Patent number: 11821083Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: December 28, 2021Date of Patent: November 21, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 11658014Abstract: Methods and apparatus for depositing a coating on a semiconductor manufacturing apparatus component are provided herein. In some embodiments, a method of depositing a coating on a semiconductor manufacturing apparatus component includes: sequentially exposing a semiconductor manufacturing apparatus component including nickel or nickel alloy to an aluminum precursor and a reactant to form an aluminum containing layer on a surface of the semiconductor manufacturing apparatus component by a deposition process.Type: GrantFiled: April 11, 2020Date of Patent: May 23, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Pingyan Lei, Dien-Yeh Wu, Xiao Ming He, Jennifer Y. Sun, Lei Zhou, Takashi Kuratomi, Avgerinos V. Gelatos, Mei Chang, Steven D. Marcus
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Publication number: 20220307131Abstract: Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of the plurality of apertures. The systems may define a plurality of isolators. An isolator may be positioned between each lid stack and a corresponding aperture of the plurality of apertures. The systems may include a plurality of annular spacers. An annular spacer of the plurality of annular spacers may be positioned between each isolator and a corresponding lid stack of the plurality of lids stacks. The systems may include a plurality of manifolds. A manifold may be seated within an interior of each annular spacer of the plurality of annular spacers.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Applicant: Applied Materials, Inc.Inventors: Anantha K. Subramani, Seyyed Abdolreza Fazeli, Yang Guo, Ramcharan Sundar, Arun Kumar Kotrappa, Steven Mosbrucker, Steven D. Marcus, Xinhai Han, Kesong Hu, Tianyang Li, Philip A. Kraus
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Publication number: 20220119942Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Applicant: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Publication number: 20220059362Abstract: Provided are self-aligned double patterning methods including feature trimming. The SADP process is performed in a single batch processing chamber in which the substrate is laterally moved between sections of the processing chamber separated by gas curtains so that each section independently has a process condition.Type: ApplicationFiled: November 1, 2021Publication date: February 24, 2022Applicant: Applied Materials, Inc.Inventors: Ning Li, Victor Nguyen, Mihaela A. Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven D. Marcus
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Patent number: 11230763Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: January 16, 2020Date of Patent: January 25, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 11164753Abstract: Provided are self-aligned double patterning methods including feature trimming. The SADP process is performed in a single batch processing chamber in which the substrate is laterally moved between sections of the processing chamber separated by gas curtains so that each section independently has a process condition.Type: GrantFiled: January 13, 2015Date of Patent: November 2, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Ning Li, Victor Nguyen, Mihaela Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven D. Marcus
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Publication number: 20210032745Abstract: Disclosed is a coated chamber component comprising a body having a reduced metal surface such that the reduced metal surface has less metal oxide as compared to an amount of metal oxide on a metal surface that has not been reduced. The metal surface may be reduced by pulsing a reducing alcohol thereon. The reduced metal surface may be coated with a corrosion resistant film that may be deposited onto the reduced metal surface by a dry atomic layer deposition process.Type: ApplicationFiled: July 22, 2020Publication date: February 4, 2021Inventors: Lisa J. Enman, Steven D. Marcus, Mark J. Saly, Lei Zhou
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Publication number: 20200149161Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: January 16, 2020Publication date: May 14, 2020Applicant: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Patent number: 10570511Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: GrantFiled: August 31, 2015Date of Patent: February 25, 2020Assignee: Applied Materials, Inc.Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Publication number: 20160068953Abstract: Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system.Type: ApplicationFiled: August 31, 2015Publication date: March 10, 2016Inventors: Ning Li, Steven D. Marcus, Tai T. Ngo, Kevin Griffin
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Publication number: 20150200110Abstract: Provided are self-aligned double patterning methods including feature trimming. The SADP process is performed in a single batch processing chamber in which the substrate is laterally moved between sections of the processing chamber separated by gas curtains so that each section independently has a process condition.Type: ApplicationFiled: January 13, 2015Publication date: July 16, 2015Inventors: Ning Li, Victor Nguyen, Mihaela Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven D. Marcus
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Publication number: 20140023794Abstract: Provided are methods and apparatus for low temperature atomic layer deposition of a densified film. A low temperature film is formed and densified by exposure to one or more of a plasma or radical species. The resulting densified film has superior properties to low temperature films formed without densification.Type: ApplicationFiled: July 23, 2013Publication date: January 23, 2014Inventors: Maitreyee Mahajani, Steven D. Marcus, Li-Qun Xia, Mihaela Balseanu, Victor Nguyen, Ning Li, Jingjing Liu, Sukti Chatterjee, Timothy W. Weidman
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Publication number: 20130164445Abstract: Provided are assemblies comprising an elongate enclosure comprising a material resistant to thermal expansion at temperatures experienced in a processing chamber. At least one heating element extends along a longitudinal axis of the elongate enclosure through an open interior region allowing a flow of gases to pass the heating element in a direction substantially perpendicular to the longitudinal axis. Methods of processing substrates using a heating element to excite gaseous precursor species are also described.Type: ApplicationFiled: December 19, 2012Publication date: June 27, 2013Inventors: Garry K. Kwong, Joseph Yudovsky, Steven D. Marcus
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Publication number: 20130143415Abstract: Provided are atomic layer deposition apparatus and methods including a gas distribution plate comprising a plurality of elongate gas ports including at least one first reactive gas port in fluid communication with a first reactive gas and at least one second reactive gas port in fluid communication with a gas manifold. The gas manifold is in fluid communication with at least a second reactive gas different from the first reactive gas and a purge gas. Also provided are atomic layer deposition apparatus and methods including linear energy sources in one or more of region before the gas distribution plate and a region after the gas distribution plate.Type: ApplicationFiled: December 1, 2011Publication date: June 6, 2013Applicant: Applied Materials, Inc.Inventors: Joseph Yudovsky, Mei Chang, Steven D. Marcus, Garry K. Kwong
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Publication number: 20130019960Abstract: Provided are apparatus and methods for generating a chemical precursor. The apparatus comprises an inlet line to be connected to an ampoule and an outlet line to be connected to an ampoule. The inlet line having an inlet valve to control the flow of a carrier gas into the ampoule and the outlet line has an outlet valve to control the flow exiting the ampoule. A bypass valve allows carrier gas to bypass the ampoule and purge the outlet valve without flowing gas into the ampoule.Type: ApplicationFiled: July 20, 2012Publication date: January 24, 2013Applicant: Applied Materials, Inc.Inventors: Kenric Choi, Joseph Yudovsky, Steven D. Marcus, Ernesto Ulloa