Patents by Inventor Steven E. Gianoulakis
Steven E. Gianoulakis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7722719Abstract: Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.Type: GrantFiled: March 7, 2005Date of Patent: May 25, 2010Assignee: Applied Materials, Inc.Inventors: Lawrence Chung-Lai Lei, Siqing Lu, Steven E. Gianoulakis, Won B. Bang, David P. Sun, Yen-Kun Victor Wang
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Publication number: 20080000530Abstract: A gas flow comparator comprises a gas control mounted on a gas tube to set a gas flow or pressure of a gas passing thorough the gas tube. A principal flow splitter comprises an inlet port connected to the gas tube. First and second flow restrictors are connected to the principal flow splitter. A pair of secondary flow splitters are each connected to a restrictor outlet of a flow restrictor. A differential pressure gauge is connected to the secondary flow splitters. A pair of nozzle holders are connected to the secondary flow splitters and are capable of being connected to first and second nozzles. In operation, the pressure differential gauge registers a pressure differential proportional to a variation in the passage of gas through the first and second nozzles.Type: ApplicationFiled: May 25, 2007Publication date: January 3, 2008Inventors: DAVID P. SUN, Daniel J. Coffman, Sophia M. Velastegui, Steven E. Gianoulakis, Abhijit Desai
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Patent number: 6825448Abstract: Embodiments of the present invention are directed to relieving the stresses caused by a mismatch in the coefficients of thermal expansion in the components forming the connections at the terminals of a heater. In one embodiment, a heater comprises a heater body having an electrical heating element and a bottom surface, and a rod configured to be coupled with an electrical power source. A plug has a first end which is coupled to the heater body and extends into the heater body through the bottom surface of the heater body, and which is electrically connected with the electrical heating element. The plug has a second end which includes a cavity to receive a portion of the rod. The cavity is surrounded by a slotted side wall of the plug which is disposed outside of the heater body and includes a plurality of slots extending from the second end toward the bottom surface of the heater body and terminating near the bottom surface but before reaching the bottom surface.Type: GrantFiled: May 1, 2003Date of Patent: November 30, 2004Assignee: Applied Materials, Inc.Inventor: Steven E. Gianoulakis
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Publication number: 20040217104Abstract: Embodiments of the present invention are directed to relieving the stresses caused by a mismatch in the coefficients of thermal expansion in the components forming the connections at the terminals of a heater. In one embodiment, a heater comprises a heater body having an electrical heating element and a bottom surface, and a rod configured to be coupled with an electrical power source. A plug has a first end which is coupled to the heater body and extends into the heater body through the bottom surface of the heater body, and which is electrically connected with the electrical heating element. The plug has a second end which includes a cavity to receive a portion of the rod. The cavity is surrounded by a slotted side wall of the plug which is disposed outside of the heater body and includes a plurality of slots extending from the second end toward the bottom surface of the heater body and terminating near the bottom surface but before reaching the bottom surface.Type: ApplicationFiled: May 1, 2003Publication date: November 4, 2004Applicant: Applied Materials, Inc.Inventor: Steven E. Gianoulakis
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Patent number: 6441885Abstract: Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.Type: GrantFiled: July 10, 2001Date of Patent: August 27, 2002Assignee: EUV LLCInventors: Steven E. Gianoulakis, Avijit K. Ray-Chaudhuri
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Patent number: 6395455Abstract: Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.Type: GrantFiled: July 10, 2001Date of Patent: May 28, 2002Assignee: EUV LLCInventors: Steven E. Gianoulakis, Avijit K. Ray-Chaudhuri
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Patent number: 6350310Abstract: A method and apparatus for producing crystals that minimizes birefringence even at large crystal sizes, and is suitable for production of CaF2 crystals. The method of the present invention comprises annealing a crystal by maintaining a minimal temperature gradient in the crystal while slowly reducing the bulk temperature of the crystal. An apparatus according to the present invention includes a thermal control system added to a crystal growth and annealing apparatus, wherein the thermal control system allows a temperature gradient during crystal growth but minimizes the temperature gradient during crystal annealing.Type: GrantFiled: June 7, 1999Date of Patent: February 26, 2002Assignee: Sandia CorporationInventor: Steven E. Gianoulakis
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Publication number: 20020011202Abstract: A method and apparatus for producing crystals that minimizes birefringence even at large crystal sizes, and is suitable for production of CaF2 crystals. The method of the present invention comprises annealing a crystal by maintaining a minimal temperature gradient in the crystal while slowly reducing the bulk temperature of the crystal. An apparatus according to the present invention includes a thermal control system added to a crystal growth and annealing apparatus, wherein the thermal control system allows a temperature gradient during crystal growth but minimizes the temperature gradient during crystal annealing. An embodiment of the present invention comprises a secondary heater incorporated into a conventional crystal growth and annealing apparatus. The secondary heater supplies heat to minimize the temperature gradients in the crystal during the annealing process. The secondary heater can mount near the bottom of the crucible to effectively maintain appropriate temperature gradients.Type: ApplicationFiled: September 15, 2001Publication date: January 31, 2002Inventors: Steven E. Gianoulakis, Robert Sparrow
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Publication number: 20020006556Abstract: Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.Type: ApplicationFiled: July 10, 2001Publication date: January 17, 2002Inventors: Steven E. Gianoulakis, Avijit K. Ray-Chaudhuri
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Publication number: 20020001760Abstract: Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.Type: ApplicationFiled: July 10, 2001Publication date: January 3, 2002Inventors: Steven E. Gianoulakis, Avijit K. Ray-Chaudhuri
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Patent number: 6316150Abstract: Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.Type: GrantFiled: August 24, 1998Date of Patent: November 13, 2001Assignee: EUV LLCInventors: Steven E. Gianoulakis, Avijit K. Ray-Chaudhuri
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Patent number: 6309461Abstract: A method and apparatus for producing crystals that minimizes birefringence even at large crystal sizes, and is suitable for production of CaF2 crystals. The method of the present invention comprises annealing a crystal by maintaining a minimal temperature gradient in the crystal while slowly reducing the bulk temperature of the crystal. An apparatus according to the present invention includes a thermal control system added to a crystal growth and annealing apparatus, wherein the thermal control system allows a temperature gradient during crystal growth but minimizes the temperature gradient during crystal annealing. An embodiment of the present invention comprises a secondary heater incorporated into a conventional crystal growth and annealing apparatus. The secondary heater supplies heat to minimize the temperature gradients in the crystal during the annealing process. The secondary heater can mount near the bottom of the crucible to effectively maintain appropriate temperature gradients.Type: GrantFiled: June 7, 1999Date of Patent: October 30, 2001Assignees: Sandia Corporation, Corning, IncorporatedInventors: Steven E. Gianoulakis, Robert Sparrow