Abstract: An apparatus for generating Smith-Purcell radiation having at least one spectral component at a wavelength ? includes a periodic structure including a dielectric material and an electron source, in electromagnetic communication with the periodic structure, to emit an electron beam propagating within about 5? from a surface of the periodic structure to induce emission of the Smith-Purcell radiation. The electron beam has an electron energy tunable between about 0.5 keV and about 40 keV so as to change a wavelength of the Smith-Purcell radiation.

Abstract: An apparatus for generating Smith-Purcell radiation having at least one spectral component at a wavelength A includes a periodic structure including a dielectric material and an electron source, in electromagnetic communication with the periodic structure, to emit an electron beam propagating within about 5? from a surface of the periodic structure to induce emission of the Smith-Purcell radiation. The electron beam has an electron energy tunable between about 0.5 keV and about 40 keV so as to change a wavelength of the Smith-Purcell radiation.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.