Patents by Inventor Steven Edward Molesa
Steven Edward Molesa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9799783Abstract: Dopant ink compositions and methods of fabricating solar cells there from are described. A dopant ink composition may include a cross-linkable matrix precursor, a bound dopant species, and a solvent. A method of fabricating a solar cell may include delivering a dopant ink composition to a region above a substrate. The dopant ink composition includes a cross-linkable matrix precursor, a bound dopant species, and a solvent. The method also includes baking the dopant ink composition to remove a substantial portion of the solvent of the dopant ink composition, curing the baked dopant ink composition to cross-link a substantial portion of the cross-linkable matrix precursor of the dopant ink composition, and driving dopants from the cured dopant ink composition toward the substrate.Type: GrantFiled: March 31, 2015Date of Patent: October 24, 2017Assignee: SunPower CorporationInventors: Paul Loscutoff, Kahn Wu, Steven Edward Molesa
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Patent number: 9559246Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: GrantFiled: November 18, 2015Date of Patent: January 31, 2017Assignee: SunPower CorporationInventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Patent number: 9559228Abstract: Solar cells with doped groove regions separated by ridges and methods of fabricating solar cells are described. In an example, a solar cell includes a substrate having a surface with a plurality of grooves and ridges. A first doped region of a first conductivity type is disposed in a first of the grooves. A second doped region of a second conductivity type, opposite the first conductivity type, is disposed in a second of the grooves. The first and second grooves are separated by one of the ridges.Type: GrantFiled: September 30, 2011Date of Patent: January 31, 2017Assignee: SunPower CorporationInventors: Steven Edward Molesa, Thomas Pass, Steve Kraft
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Patent number: 9437757Abstract: A method of fabricating a solar cell is disclosed. The method includes forming a polished surface on a silicon substrate and forming a first flowable matrix in an interdigitated pattern on the polished surface, where the polished surface allows the first flowable matrix to form an interdigitated pattern comprising features of uniform thickness and width. In an embodiment, the method includes forming the silicon substrate using a method such as, but not limited to, of diamond wire or slurry wafering processes. In another embodiment, the method includes forming the polished surface on the silicon substrate using a chemical etchant such as, but not limited to, sulfuric acid (H2SO4), acetic acid (CH3COOH), nitric acid (HNO3), hydrofluoric acid (HF) or phosphoric acid (H3PO4). In still another embodiment, the etchant is an isotropic etchant. In yet another embodiment, the method includes providing a surface of the silicon substrate with at most 500 nanometer peak-to-valley roughness.Type: GrantFiled: June 19, 2015Date of Patent: September 6, 2016Assignee: SunPower CorporationInventors: Genevieve A. Solomon, Scott Harrington, Kahn Wu, Paul Loscutoff, Junbo Wu, Steven Edward Molesa
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Publication number: 20160071999Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: ApplicationFiled: November 18, 2015Publication date: March 10, 2016Inventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Patent number: 9252319Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: GrantFiled: June 12, 2014Date of Patent: February 2, 2016Assignee: SunPower CorporationInventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Publication number: 20150364625Abstract: A method of fabricating a solar cell is disclosed. The method includes forming a polished surface on a silicon substrate and forming a first flowable matrix in an interdigitated pattern on the polished surface, where the polished surface allows the first flowable matrix to form an interdigitated pattern comprising features of uniform thickness and width. In an embodiment, the method includes forming the silicon substrate using a method such as, but not limited to, of diamond wire or slurry wafering processes. In another embodiment, the method includes forming the polished surface on the silicon substrate using a chemical etchant such as, but not limited to, sulfuric acid (H2SO4), acetic acid (CH3COOH), nitric acid (HNO3), hydrofluoric acid (HF) or phosphoric acid (H3PO4). In still another embodiment, the etchant is an isotropic etchant. In yet another embodiment, the method includes providing a surface of the silicon substrate with at most 500 nanometer peak-to-valley roughness.Type: ApplicationFiled: June 19, 2015Publication date: December 17, 2015Inventors: Genevieve A. Solomon, Scott Harrington, Kahn Wu, Paul Loscutoff, Junbo Wu, Steven Edward Molesa
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Publication number: 20150206988Abstract: Dopant ink compositions and methods of fabricating solar cells there from are described. A dopant ink composition may include a cross-linkable matrix precursor, a bound dopant species, and a solvent. A method of fabricating a solar cell may include delivering a dopant ink composition to a region above a substrate. The dopant ink composition includes a cross-linkable matrix precursor, a bound dopant species, and a solvent. The method also includes baking the dopant ink composition to remove a substantial portion of the solvent of the dopant ink composition, curing the baked dopant ink composition to cross-link a substantial portion of the cross-linkable matrix precursor of the dopant ink composition, and driving dopants from the cured dopant ink composition toward the substrate.Type: ApplicationFiled: March 31, 2015Publication date: July 23, 2015Inventors: Paul Loscutoff, Kahn Wu, Steven Edward Molesa
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Patent number: 9082925Abstract: A method of fabricating a solar cell is disclosed. The method includes forming a polished surface on a silicon substrate and forming a first flowable matrix in an interdigitated pattern on the polished surface, where the polished surface allows the first flowable matrix to form an interdigitated pattern comprising features of uniform thickness and width. In an embodiment, the method includes forming the silicon substrate using a method such as, but not limited to, of diamond wire or slurry wafering processes. In another embodiment, the method includes forming the polished surface on the silicon substrate using a chemical etchant such as, but not limited to, sulfuric acid (H2SO4), acetic acid (CH3COOH), nitric acid (HNO3), hydrofluoric acid (HF) or phosphoric acid (H3PO4). In still another embodiment, the etchant is an isotropic etchant. In yet another embodiment, the method includes providing a surface of the silicon substrate with at most 500 nanometer peak-to-valley roughness.Type: GrantFiled: March 13, 2013Date of Patent: July 14, 2015Assignee: SunPower CorporationInventors: Genevieve A. Solomon, Scott Harrington, Kahn Wu, Paul Loscutoff, Junbo Wu, Steven Edward Molesa
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Patent number: 9018033Abstract: A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.Type: GrantFiled: October 23, 2013Date of Patent: April 28, 2015Assignee: SunPower CorporationInventors: Kahn C. Wu, Steven M. Kraft, Paul Loscutoff, Steven Edward Molesa
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Patent number: 8992803Abstract: Dopant ink compositions and methods of fabricating solar cells there from are described. A dopant ink composition may include a cross-linkable matrix precursor, a bound dopant species, and a solvent. A method of fabricating a solar cell may include delivering a dopant ink composition to a region above a substrate. The dopant ink composition includes a cross-linkable matrix precursor, a bound dopant species, and a solvent. The method also includes baking the dopant ink composition to remove a substantial portion of the solvent of the dopant ink composition, curing the baked dopant ink composition to cross-link a substantial portion of the cross-linkable matrix precursor of the dopant ink composition, and driving dopants from the cured dopant ink composition toward the substrate.Type: GrantFiled: September 30, 2011Date of Patent: March 31, 2015Assignee: SunPower CorporationInventors: Paul Loscutoff, Kahn Wu, Steven Edward Molesa
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Publication number: 20140295609Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: ApplicationFiled: June 12, 2014Publication date: October 2, 2014Inventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Publication number: 20140273331Abstract: A method of fabricating a solar cell is disclosed. The method includes forming a polished surface on a silicon substrate and forming a first flowable matrix in an interdigitated pattern on the polished surface, where the polished surface allows the first flowable matrix to form an interdigitated pattern comprising features of uniform thickness and width. In an embodiment, the method includes forming the silicon substrate using a method such as, but not limited to, of diamond wire or slurry wafering processes. In another embodiment, the method includes forming the polished surface on the silicon substrate using a chemical etchant such as, but not limited to, sulfuric acid (H2SO4), acetic acid (CH3COOH), nitric acid (HNO3), hydrofluoric acid (HF) or phosphoric acid (H3PO4). In still another embodiment, the etchant is an isotropic etchant. In yet another embodiment, the method includes providing a surface of the silicon substrate with at most 500 nanometer peak-to-valley roughness.Type: ApplicationFiled: March 13, 2013Publication date: September 18, 2014Inventors: Genevieve A. Solomon, Scott Harrington, Kahn Wu, Paul Loscutoff, Junbo Wu, Steven Edward Molesa
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Patent number: 8785233Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: GrantFiled: December 19, 2012Date of Patent: July 22, 2014Assignee: SunPower CorporationInventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Publication number: 20140170800Abstract: Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.Type: ApplicationFiled: December 19, 2012Publication date: June 19, 2014Inventors: Paul Loscutoff, David D. Smith, Michael Morse, Ann Waldhauer, Taeseok Kim, Steven Edward Molesa
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Publication number: 20140166093Abstract: Methods of fabricating solar cell emitter regions using N-type doped silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a plurality of regions of N-type doped silicon nano-particles on a first surface of a substrate of the solar cell. A P-type dopant-containing layer is formed on the plurality of regions of N-type doped silicon nano-particles and on the first surface of the substrate between the regions of N-type doped silicon nano-particles. At least a portion of the P-type dopant-containing layer is mixed with at least a portion of each of the plurality of regions of N-type doped silicon nano-particles.Type: ApplicationFiled: December 18, 2012Publication date: June 19, 2014Inventors: Paul Loscutoff, Peter J. Cousins, Steven Edward Molesa, Ann Waldhauer
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Publication number: 20140048133Abstract: A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.Type: ApplicationFiled: October 23, 2013Publication date: February 20, 2014Inventors: Kahn C. Wu, Steven M. Kraft, Paul Loscutoff, Steven Edward Molesa
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Patent number: 8586397Abstract: A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.Type: GrantFiled: September 30, 2011Date of Patent: November 19, 2013Assignee: SunPower CorporationInventors: Kahn C. Wu, Steven M. Kraft, Paul Loscutoff, Steven Edward Molesa
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Publication number: 20130081680Abstract: Solar cells with doped groove regions separated by ridges and methods of fabricating solar cells are described. In an example, a solar cell includes a substrate having a surface with a plurality of grooves and ridges. A first doped region of a first conductivity type is disposed in a first of the grooves. A second doped region of a second conductivity type, opposite the first conductivity type, is disposed in a second of the grooves. The first and second grooves are separated by one of the ridges.Type: ApplicationFiled: September 30, 2011Publication date: April 4, 2013Inventors: Steven Edward Molesa, Thomas Pass, Steve Kraft
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Publication number: 20130081687Abstract: A method of manufacturing solar cells is disclosed. The method comprises depositing an etch-resistant dopant material on a silicon substrate, the etch-resistant dopant material comprising a dopant source, forming a cross-linked matrix in the etch-resistant dopant material using a non-thermal cure of the etch-resistant dopant material, and heating the silicon substrate and the etch-resistant dopant material to a temperature sufficient to cause the dopant source to diffuse into the silicon substrate.Type: ApplicationFiled: September 30, 2011Publication date: April 4, 2013Inventors: Kahn C. Wu, Steven M. Kraft, Paul Loscutoff, Steven Edward Molesa