Abstract: A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.

Abstract: A method and apparatus are provided that have the capability of rapidly scanning a large sample of arbitrary characteristics under force control feedback so has to obtain a high resolution image. The method includes generating relative scanning movement between a probe of the SPM and a sample to scan the probe through a scan range of at least 4 microns at a rate of at least 30 lines/sec and controlling probe-sample interaction with a force control slew rate of at least 1 mm/sec. A preferred SPM capable of achieving these results has a force controller having a force control bandwidth of at least closed loop bandwidth of at least 10 kHz.

Abstract: A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.

Abstract: A method and apparatus are provided that have the capability of rapidly scanning a large sample of arbitrary characteristics under force control feedback so has to obtain a high resolution image. The method includes generating relative scanning movement between a probe of the SPM and a sample to scan the probe through a scan range of at least 4 microns at a rate of at least 30 lines/sec and controlling probe-sample interaction with a force control slew rate of at least 1 mm/sec. A preferred SPM capable of achieving these results has a force controller having a force control bandwidth of at least closed loop bandwidth of at least 10 kHz.

Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

Abstract: A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to ˜100 &mgr;m, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

Abstract: An optical system assembly technique utilizes a templating system for locating optical components 200 on optical benches 150. Specifically, the template system comprises a template substrate 102 that is placed over the optical bench. The substrate 102 has at least one alignment slot 104 that is formed through the substrate. This alignment slot 104 has an alignment feature 120, against which an optical component 200 is registered. In order to improve the accuracy of the alignment of the optical component on the optical bench, the slot 104 has a reentrant, such as a smooth or step, sidewall 106 extending from the alignment feature 120 into the template substrate 102. This way, there is a single point or near single point of contact between the optical component 200 and the template 102, to thereby improve the placement precision for the optical component on the optical bench 150.

Abstract: An optical system assembly technique utilizes a templating system for locating optical components 200 on optical benches 150. Specifically, the template system comprises a template substrate 102 that is placed over the optical bench. The substrate 102 has at least one alignment slot 104 that is formed through the substrate. This alignment slot 104 has an alignment feature 120, against which an optical component 200 is registered. In order to improve the accuracy of the alignment of the optical component on the optical bench, the slot 104 has a reentrant, such as a smooth or step, sidewall 106 extending from the alignment feature 120 into the template substrate 102. This way, there is a single point or near single point of contact between the optical component 200 and the template 102, to thereby improve the placement precision for the optical component on the optical bench 150.

Abstract: An optical membrane device and method for making such a device are described. This membrane is notable in that it comprises an optically curved surface. In some embodiments, this curved optical surface is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.

Abstract: The invention overcomes limitations of conventional power and thermodynamic sources by with micromachinery components that enable production of significant power and efficient operation of thermodynamic systems in the millimeter and micron regime to meet the efficiency, mobility, modularity, weight, and cost requirements of many modern applications. A micromachine of the invention has a rotor disk journalled for rotation in a stationary structure by a journal bearing. A plurality of radial flow rotor blades, substantially untapered in height, are disposed on a first rotor disk face, and an electrically conducting region is disposed on a rotor disk face. A plurality of stator electrodes that are electrically interconnected to define multiple electrical stator phases are disposed on a wall of the stationary structure located opposite the electrically conducting region of the rotor disk.

Abstract: A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress. Competing techniques such as shadow masking yield lower quality features and are difficult to align. Further, the minimum feature size that can be obtained with shadow masks is limited to ˜100 &mgr;m, depending on the coating system geometry, and they require hard contact with the surface of the wafer, which can lead to damage and/or particulate contamination.

Abstract: The invention provides a micro-gas turbine engine and associated microcomponentry. The engine components, including, e.g., a compressor, a diffuser having diffuser vanes, a combustion chamber, turbine guide vanes, and a turbine are each manufactured by, e.g., microfabrication techniques, of a structural material common to all of the elements, e.g., a microelectronic material such as silicon or silicon carbide. Vapor deposition techniques, as well as bulk wafer etching techniques, can be employed to produce the engine. The engine includes a rotor having a shaft with a substantially untapered compressor disk on a first end, defining a centrifugal compressor, and a substantially untapered turbine disk on the opposite end, defining a radial inflow turbine. The rotor is preferably formed of a material characterized by a strength-to-density ratio that enables a rotor speed of at least about 500,000 rotations per minute.