Patents by Inventor Steven G. Sergi

Steven G. Sergi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Carbon dopant gas and co-flow for implant beam and source life performance improvement
    Patent number: 10354877
    Abstract: Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: July 16, 2019
    Assignee: Entegris, Inc.
    Inventors: Oleg Byl, Edward A. Sturm, Ying Tang, Sharad N. Yedave, Joseph D. Sweeney, Steven G. Sergi, Barry Lewis Chambers
  • CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERFORMANCE IMPROVEMENT
    Publication number: 20180211839
    Abstract: Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.
    Type: Application
    Filed: March 22, 2018
    Publication date: July 26, 2018
    Inventors: Oleg Byl, Edward A. Sturm, Ying Tang, Sharad N. Yedave, Joseph D. Sweeney, Steven G. Sergi, Barry Lewis Chambers
  • Carbon dopant gas and co-flow for implant beam and source life performance improvement
    Patent number: 9960042
    Abstract: Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.
    Type: Grant
    Filed: February 13, 2013
    Date of Patent: May 1, 2018
    Assignee: Entegris Inc.
    Inventors: Oleg Byl, Edward A. Sturm, Ying Tang, Sharad N. Yedave, Joseph D. Sweeney, Steven G. Sergi, Barry Lewis Chambers
  • CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERFORMANCE IMPROVEMENT
    Publication number: 20160020102
    Abstract: Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.
    Type: Application
    Filed: February 13, 2013
    Publication date: January 21, 2016
    Applicant: Entegris Inc.
    Inventors: Oleg Byl, Edward A. Sturm, Ying Tang, Sharad N. Yedave, Joseph D. Sweeney, Steven G. Sergi, Barry Lewis Chambers
  • ION IMPLANTATION TOOL CLEANING APPARATUS AND METHOD
    Publication number: 20120111374
    Abstract: Apparatus and methods for cleaning ion implanters and/or components thereof are described, utilizing cleaning agents reacted with residue deposits to effect removal thereof. An endpoint detection apparatus and method are also disclosed, which may be integrated in the cleaning apparatus and methods to provide highly efficient utilization of the cleaning agent and avoidance of deleterious effects that otherwise can occur when cleaning agents are continued to be exposed to an implanter or components thereof after cleaning has been completed.
    Type: Application
    Filed: November 8, 2011
    Publication date: May 10, 2012
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Joseph R. Despres, James V. McManus, Richard D. Chism, Edward E. Jones, Joseph D. Sweeney, Steven G. Sergi, Ying Tang, Michael J. Wodjenski, Richard S. Ray, Barry Lewis Chambers