Abstract: An accumulator plate device attachable to a transmission valve body. The accumulator plate device is stronger than existing accumulator plates and is able to resist bending and breaking forces from valve and spring activation pressures. The accumulator plate device employs novel securing features integrated into or attached to the accumulator plate device at various locations designed to resist the higher pressures. The securing features are designed to engage specific locations on a lip of a lateral edge of the transmission valve body to prevent damage to the accumulator plate device from mechanical stress on the accumulator plate device from the hydraulic pressure inside the transmission valve body.

Abstract: A system and method may present, by a first application being executed by an electronic device, a first user interface that enables a user to select a food item and/or non-food item for purchase at a retail establishment. In response to receiving, by the first application, a request from the user using the first user interface to purchase a beverage at the retail establishment, a second application may be linked with the first application. A data repository inclusive of selectable beverage options available for dispensing by a beverage dispenser at the retail establishment may be accessed. The second application may present a second user interface for selection of a selectable beverage option. A selected beverage instruction code representative of a selected beverage may be generated and communicated to the beverage dispenser at the retail establishment to cause the beverage dispenser to be configured for dispensing the selected beverage.

Abstract: A system and method may present, by a first application being executed by an electronic device, a first user interface that enables a user to select a food item and/or non-food item for purchase at a retail establishment. In response to receiving, by the first application, a request from the user using the first user interface to purchase a beverage at the retail establishment, a second application may be linked with the first application. A data repository inclusive of selectable beverage options available for dispensing by a beverage dispenser at the retail establishment may be accessed. The second application may present a second user interface for selection of a selectable beverage option. A selected beverage instruction code representative of a selected beverage may be generated and communicated to the beverage dispenser at the retail establishment to cause the beverage dispenser to be configured for dispensing the selected beverage.

Abstract: A server in a data center is supplied with power by a power distribution unit (“PDU”) having outlet-level power monitoring and switching capability. A predetermined server-specific time after a shutdown command has been issued to the server, the level of power consumption of the server is compared with a predetermined server-specific level of power consumption. If the level of power consumption of the server at that time is less than the server-specific level of power consumption, the server is considered to have been gracefully shut down and power to the server is switched off by delivering an appropriate command to the PDU. If the level of power consumption of the server at that time is not less than the server-specific level of consumption, this indicates a malfunction and power to the server is maintained so the cause can be determined and remedied without unnecessarily corrupting data or damaging the server.

Abstract: A server in a data center is supplied with power by a power distribution unit (“PDU”) having outlet-level power monitoring and switching capability. A predetermined server-specific time after a shutdown command has been issued to the server, the level of power consumption of the server is compared with a predetermined server-specific level of power consumption. If the level of power consumption of the server at that time is less than the server-specific level of power consumption, the server is considered to have been gracefully shut down and power to the server is switched off by delivering an appropriate command to the PDU. If the level of power consumption of the server at that time is not less than the server-specific level of consumption, this indicates a malfunction and power to the server is maintained so the cause can be determined and remedied without unnecessarily corrupting data or damaging the server.

Abstract: Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of the reactive gas can also be enhanced by ultraviolet (UV) or infrared (IR) radiation directed at the reactive zone. The wafer is rotates so that the reactive zone traverses the entire edge region. Multiple gas/light delivery systems can cause gas and light to impinge on multiple reactive zones, both on the front side and on the back side of the wafer.

Abstract: Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of the reactive gas can also be enhanced by ultraviolet (UV) or infrared (IR) radiation directed at the reactive zone. The wafer is rotates so that the reactive zone traverses the entire edge region. Multiple gas/light delivery systems can cause gas and light to impinge on multiple reactive zones, both on the front side and on the back side of the wafer.

Abstract: Method and apparatus for treating an edge region of a wafer. A toroidal shaped plasma cavity has an inner diameter which is slightly less than the diameter of the wafer being treated so that only the edge region of the wafer extends into the toroidal plasma cavity. An inert gas is flowed across a front and back side of the wafer into the plasma cavity. A reactive gas is flowed directly into the plasma cavity. The gases exit the plasma cavity without flowing over the surface of the wafer.