Patents by Inventor Steven J. Nadel

Steven J. Nadel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100300877
    Abstract: A sputtering target assembly and its manufacturing method are provided for sputtering ceramic material on a substrate. The sputtering target assembly comprises a backing tube having a central portion, a first end and a second end; at least one cylindrical sputtering target member comprising a first ceramic material; and at least one collar comprising a second ceramic material different than the first ceramic material. The cylindrical sputtering target member is coupled to the backing tube at the central portion, and the collar is coupled to the backing tube at an area between one of the first and second ends and the cylindrical sputtering target member. In one embodiment, the sputtering rate of the collar is less than or equal to the sputtering rate of the cylindrical sputtering target member.
    Type: Application
    Filed: June 2, 2009
    Publication date: December 2, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Steven J. Nadel, James G. Rietzel
  • Patent number: 4866235
    Abstract: A container useful in microwave heating of foods comprises a substrate with a titanium nitride film on at least a portion of the substrate. The substrate is substantially microwave transparent except where coated with the titanium nitride film. The film is adapted to absorb microwave energy. The film thus becomes heated and transfers heat to foods when adjacent the film. This heat transfer provides crisp heating of foods, such as fried chicken, french fries and the like.
    Type: Grant
    Filed: January 24, 1989
    Date of Patent: September 12, 1989
    Assignee: The BOC Group, Inc.
    Inventors: Don Griffin, Steven J. Nadel, Tamzen L. Van Skike
  • Patent number: 4769291
    Abstract: A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.
    Type: Grant
    Filed: February 2, 1987
    Date of Patent: September 6, 1988
    Assignee: The BOC Group, Inc.
    Inventors: Abraham I. Belkind, Erik Bjornard, James J. Hofmann, Donald V. Jacobson, Steven J. Nadel