Abstract: The invention provides a chemical-mechanical polishing composition for polishing a silicon nitride containing substrate. The composition includes an aqueous carrier; cationic silica particles dispersed in the aqueous carrier, the cationic silica abrasive particles having a zeta potential of at least 10 mV in the polishing composition; a polishing additive selected from the group consisting of a polyether amine, a polysilamine, a polyvinylimidazole, and a combination thereof, wherein the polyether amine and the polysilamine have corresponding weight average molecular weights of about 1,000 g/mol or less. The composition has a pH of greater than about 6. A method for polishing a silicon nitride containing substrate is also provided.

Abstract: In a machine for driving screw anchors and other foundation components, a desired embedment depth is calculated based on a minimum required embedment depth, work point height and length of available upper leg sections. Once calculated, the machine automatically drives the screw anchor to the depth so that one of the available upper leg lengths will fit between the driven screw anchor and apex truss hardware. If a secondary condition is satisfied that guarantees sufficient pull-out strength, a new upper leg length may be selected and the driving operation terminated prior to reaching the desired embedment depth, reducing the amount of material necessary to construct the truss foundation.

Abstract: Improved masts for solar pile driving machines are provided that incorporate inline drilling as well as alignment and assembly devices that enable greater positional accuracy than possible with conventional equipment. In some cases, a jig, holder, or other device on the mast of the machine can be used to place a bearing assembly for a single-axis tracker while the foundation is being installed. Also disclosed are various multi-piece foundation piles that enable positional adjustment between below and above-ground components to compensate for misalignment.

Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a pH of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.

Abstract: Systems and methods are provided for performing site preparation work when building a single-axis tracker solar power plant. An installation and assembly machine is outfitted with a positioning system. At the time of installation, a reference laser is located at one end of an intended tracker row and is aligned positionally with an intended axis of rotation of the tracker (e.g., the tracker torque tube). The machine is moved to the first desired installation location based on the positioning information so that the laser beam impinges on a target on the machine. The distance between the laser and target is measured. A portion of the machine containing the target is moved with respect to the beam until the measured distance is equal to a predetermined distance. Once the correct distance is confirmed, the portion of the machine containing the target may be moved to confirm that the machine mast is oriented correctly in other axes including Y, Z and yaw.

Abstract: An automated feedback-based system for driving foundation components to a desired embedment depth. A digital controller executing a stored control program controls driving components arranged on a mast of the driving machine including a drive chain motor, a rotary driver, a tool driver, and a source of compressed air. An array of sensors provides real-time feedback to a digital controller about the automated driving operation that enables the controller to adjust the operation of one or more of the driving components based on real-time driving conditions.

Abstract: A chemical mechanical polishing composition for polishing a substrate having a cobalt layer includes a water based liquid carrier, cationic silica abrasive particles dispersed in the liquid carrier, and a triazole compound, wherein the polishing composition has a pH of greater than about 6 and the cationic silica abrasive particles have a zeta potential of at least 10 mV. The triazole compound is not benzotriazole or a benzotriazole compound. A method for chemical mechanical polishing a substrate including a cobalt layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the cobalt layer from the substrate and thereby polish the substrate.

Abstract: A closed-loop feedback-control system for a screw anchor driving machine that uses a controller such as a programmable logic controller (PLC) and an array of sensors providing real-time data to control an automated screw anchor driving operation relying on a rotary driver, a crowd motor applying downforce to the rotary driver and a tool driver extending a tool through the rotary driver and screw anchor to drive screw anchors to a target depth. The tool driver is independently controllable to advance the tool at a different feed and speed than the rotary driver to respond to underground conditions encountered during driving.

Abstract: In a machine for driving screw anchors and other foundation components, a desired embedment depth is calculated based on a minimum required embedment depth, work point height and length of available upper leg sections. Once calculated, the machine automatically drives the screw anchor to the depth so that one of the available upper leg lengths will fit between the driven screw anchor and apex truss hardware. If uplift is detected during driving, the machine will add additional embedment depth. In-situ validation of driven screw anchors may be performed after the embedment depth is reached.

Abstract: In a machine for driving screw anchors and other foundation components, a desired embedment depth is calculated based on a minimum required embedment depth, work point height and length of available upper leg sections. Once calculated, the machine automatically drives the screw anchor to the depth so that one of the available upper leg lengths will fit between the driven screw anchor and apex truss hardware. If a secondary condition is satisfied that guarantees sufficient pull-out strength, a new upper leg length may be selected and the driving operation terminated prior to reaching the desired embedment depth, reducing the amount of material necessary to construct the truss foundation.

Abstract: In a machine for driving screw anchors and other foundation components, a desired embedment depth is calculated based on a minimum required embedment depth, work point height and length of available upper leg sections. Once calculated, the machine automatically drives the screw anchor to the depth so that one of the available upper leg lengths will fit between the driven screw anchor and apex truss hardware. If uplift is detected during driving, the machine will add additional embedment depth. In-situ validation of driven screw anchors may be performed after the embedment depth is reached.

Abstract: Drill bits are provided for a drilling while driving machine. In some cases, the drill bit is a multi-stage bit capable of selectively cutting at two different diameters. In others, the bit is an expanding bit that can be passed through a foundation component while its being driven. The bit has a pair of cutting wings that can move between a retracted orientation where the bit's diameter is narrower than the inner diameter of the driven component, to a splayed orientation where the diameter is equal to or larger than the driven component's outside diameter.

Abstract: Improved masts for solar pile driving machines are provided that incorporate inline drilling as well as alignment and assembly devices that enable greater positional accuracy than possible with conventional equipment. In some cases, a jig, holder, or other device on the mast of the machine can be used to place a bearing assembly for a single-axis tracker while the foundation is being installed. Also disclosed are various multi-piece foundation piles that enable positional adjustment between below and above-ground components to compensate for misalignment.

Abstract: A closed-loop feedback-control system for a screw anchor driving machine that uses a controller such as a programmable logic controller (PLC) and an array of sensors providing real-time data to control an automated screw anchor driving operation relying on a rotary driver, a crowd motor applying downforce to the rotary driver and a tool driver extending a tool through the rotary driver and screw anchor to drive screw anchors to a target depth. The tool driver is independently controllable to advance the tool at a different feed and speed than the rotary driver to respond to underground conditions encountered during driving.

Abstract: In a machine for driving screw anchors and other foundation components, a desired embedment depth is calculated based on a minimum required embedment depth, work point height and length of available upper leg sections. Once calculated, the machine automatically drives the screw anchor to the depth so that one of the available upper leg lengths will fit between the driven screw anchor and apex truss hardware. If uplift is detected during driving, the machine will add additional embedment depth. In-situ validation of driven screw anchors may be performed after the embedment depth is reached.

Abstract: A chemical mechanical polishing composition for polishing a substrate having copper, barrier, and dielectric layers includes a water based liquid carrier, cationic silica abrasive particles dispersed in the liquid carrier, and a triazole compound, wherein the polishing composition has a pH of greater than about 6 and the cationic silica abrasive particles have a zeta potential of at least 10 mV. The triazole compound is not benzotriazole or a benzotriazole compound. A method for chemical mechanical polishing a substrate including copper, barrier, and dielectric layers includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the copper, barrier, and dielectric layers from the substrate and thereby polish the substrate.

Abstract: Various embodiments of the disclosure enable installation of a utility scale solar array or other project requiring a site survey and survey markers at every ground penetration to be replaced with survey markers only at the end of each row. In addition, machine mast alignment for driving H-piles with an impact or vibratory hammer, or for driving screw anchors, helical anchors or other foundation with a rotary driver to be automated with the use of range finding lasers to orient the driving mast in X, Y and Z as well as pitch, roll and yaw based on range finding laser measurements.

Abstract: A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material includes a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and at least one of an anionic compound and a nonionic compound.

Abstract: A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material comprises, consists of, or consists essentially of a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and a cationic polymer having a charge density of greater than about 6 meq/g.

Abstract: A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material includes a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, and an organic diacid.