Patents by Inventor Steven L. Peterman

Steven L. Peterman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4978419
    Abstract: A process for defining vias through a polyimide and silicon nitride layer is disclosed. After the deposition of a first layer of silicon nitride and a second layer of polyimide, a layer of photoresist capable of producing negatively sloped walls is then lithographically defined with a pattern of vias. After the photoresist is developed, the polyimide layer is etched with a CF.sub.4 O.sub.2 gas mixture using the developed photoresist layer as etch mask. The silicon nitride layer is then etched with a CF.sub.4 /H.sub.2 gas mixture using the etched polyimide layer as an etch mask.
    Type: Grant
    Filed: May 31, 1988
    Date of Patent: December 18, 1990
    Assignee: International Business Machines Corporation
    Inventors: Madan M. Nanda, Steven L. Peterman, David Stanasolovich