Patents by Inventor Steven Mayorga

Steven Mayorga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080042105
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of an antioxidant polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and an antioxidant.
    Type: Application
    Filed: October 15, 2007
    Publication date: February 21, 2008
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Steven Mayorga, Manchao Xiao, Thomas Gaffney, Robert Syvret
  • Publication number: 20070287849
    Abstract: The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
    Type: Application
    Filed: May 24, 2007
    Publication date: December 13, 2007
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Steven Mayorga, Mark O'Neill, Kelly Chandler
  • Publication number: 20060252904
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
    Type: Application
    Filed: July 11, 2006
    Publication date: November 9, 2006
    Inventors: Steven Mayorga, Manchao Xiao, Thomas Gaffney, Robert Syvret
  • Publication number: 20050196535
    Abstract: A method for the removal of residues comprising silicon from at least a portion of the top and back of a substrate and/or deposition apparatus is disclosed herein. In one aspect, there is provided a method for removing residues comprising: treating the coated substrate and/or deposition apparatus with a removal solvent.
    Type: Application
    Filed: February 18, 2005
    Publication date: September 8, 2005
    Inventors: Scott Weigel, Shrikant Khot, Rosaleen Morris-Oskanian, Steven Mayorga, James Mac Dougall, Lee Senecal