Abstract: A controller of a chemical mechanical polishing system is configured to cause a carrier head to sweep across a polishing pad in accord with a sweep profile. The controller is also configured to select values for a plurality of control parameters to minimize a difference between a target removal profile and an expected removal profile. The plurality of control parameters include a plurality of dwell time parameters. A relationship between the plurality of control parameters and a removal rate is stored in a data structure representing a first matrix which includes a plurality of columns including a column for each dwell time parameter and a row for each position on the substrate represented in the expected removal profile, and the controller is configured to, as part of selection of the values, calculate the expected removal profile by multiplying the first matrix by a second matrix representing control parameter values.

Abstract: A chemical mechanical polishing apparatus has a platen to support a polishing pad, a carrier head comprising a rigid housing and configured to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish the substrate, an in-situ carrier head monitoring system including a sensor positioned to interact with the housing and to detect vibrational motion of the housing and generate signals based on the detected vibrational motion, and a controller. The controller is configured to generate a value for a carrier head status parameter based on received signals from the in-situ carrier head monitoring system, and change a polishing parameter or generate an alert based on the carrier head status parameter.

Abstract: A polishing system includes a platen having a top surface to support a main polishing pad. The platen is rotatable about an axis of rotation that passes through approximately the center of the platen. An annular flange projects radially outward from the platen to support an outer polishing pad. The annular flange has an inner edge secured to and rotatable with the platen and vertically fixed relative to the top surface of the platen. The annular flange is vertically deflectable such that an outer edge of the annular flange is vertically moveable relative to the inner edge. An actuator applies pressure to an underside of the annular flange in an angularly limited region, and a carrier head holds a substrate in contact with the polishing pad and is movable to selectively position a portion of the substrate over the outer polishing pad.

Abstract: A retaining ring for a carrier head of a chemical mechanical polishing system includes an annular outer portion having an annular outer surface and a plurality of flanges projecting radially inward from the annular outer portion. Adjacent flanges are separated by a gap and inner ends of the plurality of flanges provide an inner surface to contact a substrate held in the carrier head. The plurality of flanges are canted relative to radial direction.

Abstract: A three-stage display panel mount is an apparatus used to mount a display screen on a vertical wall, but the apparatus allows a user extend the display screen from vertical wall and rotate the display screen to be perpendicular to the vertical wall. The three-stage display panel includes a first-stage frame, a pair to scissor mechanisms, a pair of gas-spring struts, a second-stage frame, and a third-stage frame. The first-stage frame mounts the apparatus on the vertical wall. The pair of scissor mechanisms allows the second-stage frame to extend away from the first-stage frame, and the pair of gas-spring struts stabilizes the movement of the second-stage frame. The third-stage frame can rotate the display panel away from the second-stage frame and includes a pair of collapsible angles, which can either position the display panel parallel to the vertical wall or support the display panel perpendicular to the vertical wall.

Abstract: The invention provides peptides derived from erythroid Band 3 protein, which selectively bind to merozoite surface protein-1 (MSP-1), and/or one or more of the malaria polypeptides: BBP-1, BBP-2, BBP-3, BBP-4, BBP-5, BBP-6, RhopH3, and ABRA and prevent infection by the parasite of a Band 3-expressing cell, such as an erythrocyte. The invention also provides the isolated polypeptides BBP-1, BBP-2, BBP-3, BBP-4, BBP-5, BBP-6, RhopH3, and/or ABRA as well as peptides derived from MSP-1, which selectively bind to erythroid Band 3 protein and prevent parasite invasion into a Band 3-expressing cell, and prevent Plasmodium infection. Methods of using the malaria and MSP1 polypeptides of the invention for malaria prevention and/or treatment (e.g. in vaccines) are also provided. Antibodies that bind to the Band 3 polypeptides and anti-idiotypic antibodies thereto also are provided.