Patents by Inventor Steven R. Chapman

Steven R. Chapman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Patent number: 6871966
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: March 29, 2005
    Assignee: Avery Dennison Corporation
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang
  • Retroreflector with controlled divergence made by the method of localized substrate stress
    Publication number: 20040114243
    Abstract: A cube corner array with minute modifications of the dihedral angles of some of the cube corners is produced by introducing a stress or change via the opposite side of the substrate. The array having aberrated elements can be replicated for use in the manufacture of a tool, and the tool can be used in the manufacture of retroreflective products of broader divergence.
    Type: Application
    Filed: December 12, 2002
    Publication date: June 17, 2004
    Inventors: Dennis I. Couzin, Steven R. Chapman, Kejian Huang