Patents by Inventor Steven Randolph
Steven Randolph has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240059911Abstract: The present invention is directed towards an electrodepositable coating composition comprising an electrodepositable binder; and a thermally conductive, electrically insulative filler, a fire-retardant pigment, or a combination thereof. Also disclosed are methods of making the electrodepositable coating composition, coatings, and coated substrates.Type: ApplicationFiled: December 17, 2021Publication date: February 22, 2024Applicant: PPG Industries Ohio, Inc.Inventors: Corey James Dedomenic, Liang Ma, Marvin Michael Pollum, JR., Egle Puodziukynaite, Christopher Andrew Dacko, Kevin Thomas Sylvester, Steven Randolph Zawacky
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Patent number: 11735404Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: GrantFiled: September 10, 2020Date of Patent: August 22, 2023Assignee: FEI CompanyInventors: Alex De Marco, Sergey Gorelick, Chad Rue, Joseph Christian, Kenny Mani, Steven Randolph, Matthias Langhorst
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Publication number: 20210066056Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: ApplicationFiled: September 10, 2020Publication date: March 4, 2021Inventors: Alex DE MARCO, Sergey GORELICK, Chad RUE, Joseph CHRISTIAN, Kenny MANI, Steven RANDOLPH, Matthias LANGHORST
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Patent number: 10777383Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.Type: GrantFiled: July 6, 2018Date of Patent: September 15, 2020Assignee: FEI CompanyInventors: Cameron James Zachreson, Dolf Timmerman, Milos Toth, Jorge Filevich, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Patent number: 10501851Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.Type: GrantFiled: June 21, 2016Date of Patent: December 10, 2019Assignee: FEI CompanyInventors: Mehran Kianinia, Olga Shimoni, Igor Aharonovich, Charlene Lobo, Milos Toth, Steven Randolph, Clive D. Chandler
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Publication number: 20190206664Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.Type: ApplicationFiled: December 19, 2018Publication date: July 4, 2019Inventors: Alex DE MARCO, Sergey GORELICK, Chad RUE, Joseph CHRISTIAN, Kenny MANI, Steven RANDOLPH, Matthias LANGHORST
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Publication number: 20190013178Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.Type: ApplicationFiled: July 6, 2018Publication date: January 10, 2019Applicant: FEI CompanyInventors: Cameron James Zachreson, Dolf Timmerman, Milos Toth, Jorge Filevich, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Publication number: 20180298490Abstract: A method of creating a layer of a target deposit-material, in a first target pattern, on a substrate surface. The substrate surface is placed in a vacuum and exposed to a first chemical vapor, having precursor molecules for a seed deposit-material, thereby forming a first substrate surface area that has adsorbed the precursor molecules. Then, a charged particle beam is applied to the first substrate surface area in a second target pattern, largely identical to the first target pattern thereby forming a seed layer in a third target pattern. The seed layer is exposed to a second chemical vapor, having target deposit-material precursor molecules, which are adsorbed onto the seed layer. Finally, a laser beam is applied to the seed layer and neighboring area, thereby forming a target deposit-material layer over and about the seed layer, where exposed to the laser beam.Type: ApplicationFiled: June 20, 2018Publication date: October 18, 2018Applicant: FEI CompanyInventors: Steven Randolph, Marcus Straw
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Patent number: 10023955Abstract: A method of creating a layer of a target deposit-material, in a first target pattern, on a substrate surface. The substrate surface is placed in a vacuum and exposed to a first chemical vapor, having precursor molecules for a seed deposit-material, thereby forming a first substrate surface area that has adsorbed the precursor molecules. Then, a charged particle beam is applied to the first substrate surface area in a second target pattern, largely identical to the first target pattern thereby forming a seed layer in a third target pattern. The seed layer is exposed to a second chemical vapor, having target deposit-material precursor molecules, which are adsorbed onto the seed layer. Finally, a laser beam is applied to the seed layer and neighboring area, thereby forming a target deposit-material layer over and about the seed layer, where exposed to the laser beam.Type: GrantFiled: August 31, 2012Date of Patent: July 17, 2018Assignee: FEI CompanyInventors: Steven Randolph, Marcus Straw
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Patent number: 9983152Abstract: A system and method of characterizing a work piece, comprising: scanning an ion beam across an exposed surface of a work piece, the ion beam causing the emission of secondary electrons at multiple imaging points of the scan, the number of secondary electrons emitted varying at different ones of the multiple imaging points; detecting the emitted secondary electrons at each of the multiple imaging point to form an image, the brightness of each point in the image being determined by the number of secondary electrons detected at a corresponding imaging point on the work piece; determining grain boundaries in the work piece using the differences in brightness at different points in the image, the grain boundaries defining multiple grains; directing a charged particle beam toward one or more analysis points within one or more of the grains, the number of the one or more analysis points within each grain being less than the number of imaging points within the same grain; and detecting emissions from the work piecType: GrantFiled: November 17, 2016Date of Patent: May 29, 2018Assignee: FEI CompanyInventors: Steven Randolph, Chad Rue
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Publication number: 20180136147Abstract: A system and method of characterizing a work piece, comprising: scanning an ion beam across an exposed surface of a work piece, the ion beam causing the emission of secondary electrons at multiple imaging points of the scan, the number of secondary electrons emitted varying at different ones of the multiple imaging points; detecting the emitted secondary electrons at each of the multiple imaging point to form an image, the brightness of each point in the image being determined by the number of secondary electrons detected at a corresponding imaging point on the work piece; determining grain boundaries in the work piece using the differences in brightness at different points in the image, the grain boundaries defining multiple grains; directing a charged particle beam toward one or more analysis points within one or more of the grains, the number of the one or more analysis points within each grain being less than the number of imaging points within the same grain; and detecting emissions from the work piecType: ApplicationFiled: November 17, 2016Publication date: May 17, 2018Applicant: FEI CompanyInventors: Steven Randolph, Chad Rue
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Patent number: 9951417Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.Type: GrantFiled: October 6, 2014Date of Patent: April 24, 2018Assignee: FEI CompanyInventors: Aurélien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
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Publication number: 20170327951Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.Type: ApplicationFiled: June 21, 2016Publication date: November 16, 2017Applicant: FEI CompanyInventors: Mehran Kianinia, Olga Shimoni, Igor Aharonovich, Charlene Lobo, Milos Toth, Steven Randolph, Clive D. Chandler
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Patent number: 9812286Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.Type: GrantFiled: December 22, 2015Date of Patent: November 7, 2017Assignee: FEI CompanyInventors: David H. Narum, Milos Toth, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Publication number: 20170143142Abstract: A cup is provided having a lid with a spout defined by walls tapered towards a distal end of the spout. The lid has handles extending therefrom that are preferably formed of a first and second material having different Shore A hardnesses to define a rigid portion and a gripping portion.Type: ApplicationFiled: January 26, 2017Publication date: May 25, 2017Inventors: Ross Steven Randolph, Joseph Paul Sejnowski
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Patent number: 9591936Abstract: A cup is provided having a lid with a spout defined by walls tapered towards a distal end of the spout. The lid has handles extending therefrom that are preferably formed of a first and second material having different Shore A hardnesses to define a rigid portion and a gripping portion.Type: GrantFiled: August 7, 2012Date of Patent: March 14, 2017Assignee: Edgewell Personal Care Brands, LLCInventors: Ross Steven Randolph, Joseph Paul Sejnowski
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Publication number: 20170002467Abstract: An improved process control for a charged beam system is provided that allows the capability of accurately producing complex two and three dimensional structures from a computer generated model in a material deposition process. The process control actively monitors the material deposition process and makes corrective adjustments as necessary to produce a pattern or structure that is within an acceptable tolerance range with little or no user intervention. The process control includes a data base containing information directed to properties of a specific pattern or structure and uses an algorithm to instruct the beam system during the material deposition process. Feedback through various means such as image recognition, chamber pressure readings, and EDS signal can be used to instruct the system to make automatic system modifications, such as, beam and gas parameters, or other modifications to the pattern during a material deposition run.Type: ApplicationFiled: July 4, 2016Publication date: January 5, 2017Applicant: FEI CompanyInventors: Marcus Straw, Chad Rue, Steven Randolph, Aurelien Philippe Jean Maclou Botman, Clive D. Chandler, Mark W. Utlaut
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Patent number: 9478390Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.Type: GrantFiled: June 30, 2014Date of Patent: October 25, 2016Assignee: FEI COMPANYInventors: N. William Parker, Marcus Straw, Jorge Filevich, Aurelien Philippe Jean Maclou Botman, Steven Randolph, Clive Chandler, Mark Utlaut
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Publication number: 20160189920Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.Type: ApplicationFiled: December 22, 2015Publication date: June 30, 2016Applicant: FEI CompanyInventors: David H. Narum, Milos Toth, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Publication number: 20160181060Abstract: A method is provided for preparing a sample for correlative optical and electron imaging and correcting aberrations in the imaging process due to sample deformation. Dye-coated fiducial markers are distributed throughout the sample volume. The fiducial markers are preferably in the form of polystyrene nanospheres that are functionalized on their surface and subsequently treated with a fluorescent dye. The dye does not penetrate the sphere but only binds to the surface. By limiting the dye to the surface of the nanospheres, the shape of the spheres can be determined in iPALM and in charged particle images aiding in tracking of physical changes that may occur to the sample volume.Type: ApplicationFiled: December 22, 2014Publication date: June 23, 2016Applicant: FEI CompanyInventors: Steven Randolph, James Miyasaki, Marcus Straw