Abstract: An apparatus for patterning an array of SLM mirrors with a phase step is disclosed. The apparatus includes a spatial light modulator (SLM) mirror, and a mask. The mask includes a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.

Abstract: A method and apparatus for patterning an array of SLM mirrors with a phase step is disclosed. Additional embodiments of the present invention describe a method for processing a substrate, wherein the processed substrate is used in the apparatus for patterning an array of SLM mirrors with a phase step. The processed substrate is then placed in close proximity to the mirrors and the etching/deposition process is then done through openings in the substrate. In embodiments in which the processed substrate does not have a high enough density of openings, a stepping and repeating process is used in order to achieve complete process coverage of every mirror in an array of SLM mirrors.