Patents by Inventor Steven Towie

Steven Towie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to prevent fluorine outdiffusion from .alpha.-FC chemical vapor deposition dielectric layers
    Patent number: 5946601
    Abstract: The present invention is a liner and/or barrier layer that will encapsulate the low k materials and act as a diffusion barrier between the low k material and the surrounding metal layers. As the temperatures of the processing sequence increase the liner and/or barrier layer will decrease the diffusion of fluorine from the low k material into the surrounding metal layers. Thus, the present invention will reduce potential corrosion problems of the metal layers.
    Type: Grant
    Filed: December 31, 1997
    Date of Patent: August 31, 1999
    Assignee: Intel Corporation
    Inventors: Lawrence D. Wong, Indrajit Banerjee, Steven Towie