Abstract: Material utilization and process stability for a rotating cylindrical magnetron target used in a sputtering system are improved by incorporation of a second magnet structure or “race track”, allowing the power density on the target surface to be reduced by approximately 50% for any given point where magnetic confinement of the plasma exists. Offsetting one race track relative to the other along the longitudinal axis of the target reduces the power density at each turn-around area (relative to the longitudinal area). Modestly increasing the target material thickness at the ends of the target allows nearly all of the material between the turn-around areas to be sputtered.

Abstract: An apparatus to releasably affix a rotating cylindrical magnetron target to a spindle utilizes a threaded spindle collar engaging threads on the outside surface of the target, with a single water-to-vacuum seal located at the target and spindle interface. The threads may be removable from the target, enabling efficient assembly/disassembly and recycling.

Abstract: A method and apparatus for evacuating an enclosed chamber which utilizes a tandem connection of a booster pump and a mechanical pump in a manner to maximize the rate of evacuation of the chamber but without exceeding the rating of the booster pump and damaging it. A gas bypass around the booster pump is provided with a proportional valve that is operated to start an evacuation of the chamber with the bypass path fully opened but the gradually closing that path in a manner to maintain a differential pressure across the booster pump at a predetermined level, until the bypass path has been fully closed.