Patents by Inventor Steven W. Opie

Steven W. Opie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method employing laser ablating for providing a pattern on a substrate
    Patent number: 5505320
    Abstract: A pattern is provided on a substrate by providing the substrate with at least two layers of material thereon and providing a layer of dry imaging polymer compositions thereon. The layer of the dry imaging polymer composition is laser ablated to provide the desired personality pattern. The top exposed portion of at least the top layer is removed and the desired select pattern is laser ablated. The exposed portions of said first layer is removed and the pattern is completed through the other layers of material to thereby expose the substrate surface, without the substrate surface being subjected to laser ablating to thereby provide the desired pattern on the substrate.
    Type: Grant
    Filed: November 22, 1994
    Date of Patent: April 9, 1996
    Assignee: International Business Machines Corporation
    Inventors: Francis C. Burns, Robert L. Lewis, Steven W. Opie, Robert D. Sebesta