Patents by Inventor Stewart A. Francis
Stewart A. Francis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240173505Abstract: A patient interface for delivery of a supply of pressurised air or breathable gas to an entrance of a patient's airways comprising: a cushion member that includes a retaining structure and a seal-forming structure permanently connected to the retaining structure; a frame member attachable to the retaining structure; and a positioning and stabilising structure attachable to the frame member.Type: ApplicationFiled: February 8, 2024Publication date: May 30, 2024Inventors: Rupert Christian SCHEINER, William Laurence HITCHCOCK, Anthony Paul BARBARA, Adam Francis BARLOW, Craig David EDWARDS, Lachlan Richard GOLDSPINK, Kirrily Michele HASKARD, Murray WIlliam LEE, Frederick Arlet MAY, Gerard Michael RUMMERY, Shiva Kumar SHANMUGA SUNDARA, Chia Ik TAN, Stewart Joseph WAGNER, Alicia Kristianne WELLS, Martin FORRESTER, Ralph JOURDAN
-
Publication number: 20240128060Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.Type: ApplicationFiled: December 5, 2023Publication date: April 18, 2024Inventors: Stewart Francis Sando, Samir John Anz, David Irwin Margolese, William Andrew Goddard
-
Patent number: 11942306Abstract: Atomic layer etching (ALE) of a substrate using a wafer scale wave of precisely controlled electrons is presented. A volume of gaseous plasma including diluent and reactive species and electrons of a uniform steady state composition is generated in a positive column of a DC plasma proximate the substrate. A corrosion layer is formed on the substrate by adsorption of the reactive species to atoms at the surface of the substrate. The substrate is positively biased to draw electrons from the volume to the surface of the substrate and impart energy to the electrons to stimulate electron transitions in the corrosion layer species, resulting in ejection of the corrosion layer species via electron stimulation desorption (ESD). The substrate is negatively biased to repel the electrons from the surface of the substrate back to the volume, followed by a zero bias to restore the steady state composition of the volume.Type: GrantFiled: September 25, 2023Date of Patent: March 26, 2024Assignee: VELVETCH LLCInventors: Samir John Anz, David Irwin Margolese, William Andrew Goddard, Stewart Francis Sando
-
Patent number: 11931513Abstract: A patient interface for delivery of a supply of pressurised air or breathable gas to an entrance of a patient's airways comprising: a cushion member that includes a retaining structure and a seal-forming structure permanently connected to the retaining structure; a frame member attachable to the retaining structure; and a positioning and stabilising structure attachable to the frame member.Type: GrantFiled: December 19, 2022Date of Patent: March 19, 2024Assignee: ResMed Pty LtdInventors: Rupert Christian Scheiner, William Laurence Hitchcock, Anthony Paul Barbara, Adam Francis Barlow, Craig David Edwards, Lachlan Richard Goldspink, Kirrily Michele Haskard, Murray William Lee, Frederick Arlet May, Gerard Michael Rummery, Shiva Kumar Shanmuga Sundara, Chia Ik Tan, Stewart Joseph Wagner, Alicia Kristianne Wells, Martin Forrester, Ralph Jourdan
-
Patent number: 11887823Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.Type: GrantFiled: April 25, 2023Date of Patent: January 30, 2024Assignee: VELVETCH LLCInventors: Stewart Francis Sando, Samir John Anz, David Irwin Margolese, William Andrew Goddard
-
Patent number: 11869747Abstract: Atomic layer etching of a substrate using a wafer scale wave of precisely controlled electrons is presented. A volume of gaseous plasma including diluent and reactive species and electrons of a uniform steady state composition is generated in a positive column of a DC plasma proximate the substrate. A corrosion layer is formed on the substrate by adsorption of the reactive species to atoms at the surface of the substrate. The substrate is positively biased to draw electrons from the volume to the surface of the substrate and impart an energy to the electrons so to stimulate electron transitions in the corrosion layer species, resulting in ejection of the corrosion layer species via electron stimulation desorption (ESD). The substrate is negatively biased to repel the electrons from the surface of the substrate back to the volume, followed by a zero bias to restore the steady state composition of the volume.Type: GrantFiled: January 4, 2023Date of Patent: January 9, 2024Assignee: VELVETCH LLCInventors: Samir John Anz, David Irwin Margolese, William Andrew Goddard, Stewart Francis Sando
-
Patent number: 11810757Abstract: Atomic layer etching of a substrate using a wafer scale wave of precisely controlled electrons is presented. A volume of gaseous plasma including diluent and reactive species and electrons of a uniform steady state composition is generated in a positive column of a DC plasma proximate the substrate. A corrosion layer is formed on the substrate by adsorption of the reactive species to atoms at the surface of the substrate. The substrate is positively biased to draw electrons from the volume to the surface of the substrate and impart an energy to the electrons so to stimulate electron transitions in the corrosion layer species, resulting in ejection of the corrosion layer species via electron stimulation desorption (ESD). The substrate is negatively biased to repel the electrons from the surface of the substrate back to the volume, followed by a zero bias to restore the steady state composition of the volume.Type: GrantFiled: January 4, 2023Date of Patent: November 7, 2023Assignee: VELVETCH LLCInventors: Samir John Anz, David Irwin Margolese, William Andrew Goddard, Stewart Francis Sando
-
Publication number: 20230260765Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.Type: ApplicationFiled: April 25, 2023Publication date: August 17, 2023Inventors: Stewart Francis Sando, Samir John Anz, David Irwin Margolese, William Andrew Goddard
-
Patent number: 11715623Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: GrantFiled: September 12, 2022Date of Patent: August 1, 2023Assignee: VELVETCH LLCInventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Patent number: 11688588Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.Type: GrantFiled: February 9, 2022Date of Patent: June 27, 2023Assignee: VELVETCH LLCInventors: Stewart Francis Sando, Samir John Anz, David Irwin Margolese, William Andrew Goddard
-
Patent number: 11676797Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: GrantFiled: September 16, 2022Date of Patent: June 13, 2023Assignee: VELVETCH LLCInventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Patent number: 11664195Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: GrantFiled: November 11, 2021Date of Patent: May 30, 2023Assignee: VELVETCH LLCInventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Publication number: 20230144264Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: ApplicationFiled: November 11, 2021Publication date: May 11, 2023Inventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Publication number: 20230143453Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: ApplicationFiled: September 12, 2022Publication date: May 11, 2023Inventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Publication number: 20230140979Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.Type: ApplicationFiled: September 16, 2022Publication date: May 11, 2023Inventors: William Andrew Goddard, Stewart Francis Sando, Samir John Anz, David Irwin Margolese
-
Publication number: 20220002808Abstract: An Artificial intelligence-based method for diagnosing Alzheimer's Disease or determining susceptibility to Alzheimer's Disease includes a step of obtaining a blood sample from a target subject (e.g., a human). The degree of methylation in one or a plurality of Alzheimer indicators genes is identified for leukocytes in the blood sample. Each Alzheimer indicator gene is identified as being an indicator of the presence of or risk of developing Alzheimer's Disease. Characteristically, the at least one or the plurality of Alzheimer indicators genes have been identified by a machine learning technique or by logistic regression. Finally, the target subject is identified as being at risk for Alzheimer's Disease if the amount of methylation of one or more Alzheimer indicators genes differs from the amount of methylation established in control subjects (for the same genes) not having Alzheimer's Disease by a predetermined amount.Type: ApplicationFiled: July 2, 2021Publication date: January 6, 2022Inventors: Ray BAHADO-SINGH, Sangeetha VISHWESWARAIAH, Uppala RADHAKRISHNA, Stewart Francis GRAHAM
-
Publication number: 20140190225Abstract: A method of altering the composition of animal waste including introducing internally to an animal one or more treatment substances that can directly or indirectly affect the conversion of nitrogen containing compounds in animal waste, such that animal waste acts as a carrier so that the one or more substances affect the conversion of nitrogen containing compounds once the waste has been excreted from the animal.Type: ApplicationFiled: March 13, 2014Publication date: July 10, 2014Applicant: AgResearch LimitedInventor: Stewart Francis LEDGARD
-
Publication number: 20110047183Abstract: A system for monitoring and managing chain of custody information for an asset or a group of assets through various stages of asset transport or transformation. The system includes a server configured to assign an asset identifier relating to each specific asset, an asset record stored on a computer readable medium and linked to the asset identifier, the record configured to store data linked to a specific asset, a series of modules, each module stored on a computer readable medium, the modules comprising instructions configured to instruct a processor to access and modify the asset record as well as to establish a series of rules for managing the asset, and at least one supplier computing device operably connected to the server, the computing device configured to access at least one of the series of modules, thereby allowing a user to access and modify the asset record.Type: ApplicationFiled: August 24, 2009Publication date: February 24, 2011Applicant: HELVETA LIMITEDInventors: Brian Ford, Patrick James Newton, Stewart Francis Ross
-
Publication number: 20030017594Abstract: The invention refers to an improved method for DNA cloning and subcloning using Rec T or RecET-mediated homologous recombination. Further, novel reagent kits suitable for carrying out the method are provided.Type: ApplicationFiled: July 22, 2002Publication date: January 23, 2003Inventors: Zhang Youming, Stewart A. Francis, Muijrers P. P. Joep