Abstract: An aircraft uses trajectory-based control algorithms for blade pitch (or twist). This approach greatly enhances the ability of the actuator to accurately achieve the desired blade pitch and to track the commanded pitch position. An actuator includes an electronic rotor blade controller that converts communicated or desired changes in pitch (or similar parameter) to actual physical effects that match the desired changes as closely as possible. The controller preferably includes a motor drive circuit, such as an h-bridge, a communication circuit for connection to external commands, and a processor with associated enabling circuitry (e.g. memory, I/O) to coordinate and implement the control.

Abstract: An aircraft uses trajectory-based control algorithms for blade pitch (or twist). This approach greatly enhances the ability of the actuator to accurately achieve the desired blade pitch and to track the commanded pitch position. An actuator includes an electronic rotor blade controller that converts communicated or desired changes in pitch (or similar parameter) to actual physical effects that match the desired changes as closely as possible. The controller preferably includes a motor drive circuit, such as an h-bridge, a communication circuit for connection to external commands, and a processor with associated enabling circuitry (e.g. memory, I/O) to coordinate and implement the control.

Abstract: A lithography system includes an illumination source, projection optical elements, and a pattern mask. The illumination source includes one or more illumination poles. The pattern mask includes a set of focus-sensitive mask elements distributed with a pitch and, is configured to diffract illumination from the one or more illumination poles. The pitch may be selected such that two diffraction orders of illumination associated with each of the one or more illumination poles are asymmetrically distributed in a pupil plane of the projection optical elements. Further, the projection optical elements may expose a sample with an image of the set of focus-sensitive pattern mask elements based on the two diffraction orders of illumination associated with each of the one or more illumination poles such that one or more printing characteristics is indicative of a position of the sample within a focal volume of the projection optical elements.

Abstract: A lithography system includes an illumination source, one or more projection optical elements, and a pattern mask. The illumination source includes one or more illumination poles. The pattern mask includes a set of focus-sensitive mask elements periodically distributed with a pitch, wherein the set of focus-sensitive mask elements is configured to diffract illumination from the one or more illumination poles. The pitch is selected such that two diffraction orders of illumination associated with each of the one or more illumination poles are asymmetrically distributed in a pupil plane of the one or more projection optical elements. Further, the one or more projection optical elements are configured to expose a sample with an image of the set of focus-sensitive pattern mask elements based on the two diffraction orders of illumination associated with each of the one or more illumination poles.

Abstract: Method of handling at least one mat with the use of a crane-mounted grab head includes extending the first tooth of a first jaw of the grab head at least partially through a first hole in the mat and the first tooth of a second jaw of the grab head at least partially through a second hole in the mat. At least one actuator moves the jaws toward one another. The grab head is raised to lift the first mat. The mat is positioned at the desired location and the grab head is disengaged from the mat.

Abstract: Method of handling at least one mat with the use of a crane-mounted grab head includes extending the first tooth of a first jaw of the grab head at least partially through a first hole in the mat and the first tooth of a second jaw of the grab head at least partially through a second hole in the mat. At least one actuator moves the jaws toward one another. The grab head is raised to lift the first mat. The mat is positioned at the desired location and the grab head is disengaged from the mat.

Abstract: System for assembling a temporary surface includes a grab head and a plurality of mats configured to be placed on the ground and interconnected to form the temporary surface. The grab head includes first and second opposing jaws, each jaw having first and second spaced-apart teeth. Each tooth includes at least one flange and is engageable with one among a series of holes formed in one of the mats.

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract: A crane grab head (100) comprising a pair of jaws (102;104), a power source for moving the jaws, and a connector (116) for connecting the grab head (100) to a crane, wherein each jaw (102;104) comprises at least one tooth (110) for engaging with an object. Each jaw (102;104) is driven by a respective hydraulic/pneumatic cylinder (108a;108b)which is slideable linearly to move the jaws (102;104) between open and closed positions. The width of the grab measured between the extremities of the jaws (102;104) in the closed position is more than 1500 mm. The separation between a horizontal plane passing through the top of the uppermost cylinder (108a;108b) when the head (100) is held freely in normal use and a parallel plane passing through the lowermost edge of the lowermost tooth (110) is less than 250 mm.

Abstract: A method for setting processing parameters for fabricating an integrated circuit, by creating a mathematical model of a spin coated surface of a material over a non-flat substrate surface, where the mathematical model includes, a smoothing algorithm, where the smoothing algorithm uses as inputs only, a nominal thickness of the spin coated surface, a minimum thickness of the spin coated surface, and an interaction length, and a constraint that the spin coated surface cannot intersect the substrate surface, solving the mathematical model to determine the spin coated surface, and using the modeled spin coated surface to set the processing parameters for fabricating the integrated circuit.

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract: A method for setting processing parameters for fabricating an integrated circuit, by creating a mathematical model of a spin coated surface of a material over a non-flat substrate surface, where the mathematical model includes, a smoothing algorithm, where the smoothing algorithm uses as inputs only, a nominal thickness of the spin coated surface, a minimum thickness of the spin coated surface, and an interaction length, and a constraint that the spin coated surface cannot intersect the substrate surface, solving the mathematical model to determine the spin coated surface, and using the modeled spin coated surface to set the processing parameters for fabricating the integrated circuit.

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract: Dispensing apparatus for dispensing flowable materials onto an object. A sub-assembly of the dispensing apparatus is releasably receivable within a casing and comprises: (i) a resiliently deformable collar portion for receiving an opening of a container; (ii) a one-way input valve (see FIG. 1); a one-way output valve; and a conduit separating the valves. A cradle member having cam surfaces is pivotably connected to the casing and is provided with supporting surfaces adapted to receive the object. A manual force applied by a user in a direction corresponding to the longitudinal axis of the object causes projections on the output valve to move up the cam surfaces. In this way, the volume between the inlet and outlet valves is reduced and flowable material is directed onto the object.

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract: A method and tool for applying a sheet material to a surface of a structure, and in particular a vehicle. The tool comprises a locating assembly for locating the tool with respect to the structure, the locating assembly including a support frame and translation assembly for allowing relative movement between the structure and the tool. An applicator is supported by the support frame, and applies the sheet material to the surface of the vehicle. The sheet material may be an advertising panel.

Abstract: A laminate such as a PCB material is formed by stacking resin impregnated prepreg sheets (10) between copper foils (12), applying heat and pressure around the periphery of the stack to form an edge-sealed unit, and subjecting a number of such units to a lay-up process in a separate clean area into which they are introduced via surface-cleaning means.

Abstract: A method of preparing III-V material which is or contains one of the compounds aluminum nitride, indium nitride, indium phosphide, gallium phosphide and gallium nitride involves directing a controlled gaseous flow of a hydride of nitrogen or phosphorus as appropriate, preferably ammonia or phosphine, into the vapour of a halide, preferably a chloride, of aluminum, indium or gallium as appropriate at a temperature below the decomposition temperature of the appropriate III-V material and collecting the III-V material formed by the reaction of the hydride and the halide.