Patents by Inventor Stijn Willem Herman Steenbrink

Stijn Willem Herman Steenbrink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8987679
    Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: March 24, 2015
    Assignee: Mapper Lithography IP B.V.
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Bart Schipper
  • Publication number: 20140175300
    Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
    Type: Application
    Filed: December 20, 2012
    Publication date: June 26, 2014
    Inventors: JOHAN JOOST KONING, Stijn Willem Herman Steenbrink, Bart Schipper
  • Patent number: 8624478
    Abstract: The invention relates to a high voltage shielding arrangement comprising a first metal part and a second metal part positioned in close vicinity to said first metal part. Said second metal part included in said arrangement to be set at an electrical potential that is lower than the electric potential of the first metal part. Said second metal part having comprising one or more edges and an insulator. The second metal part is at least partially encapsulated by the insulator facing the first metal part.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: January 7, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Norman Hendrikus Rudolf Baars, Bart Schipper
  • Publication number: 20130256554
    Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
    Type: Application
    Filed: December 20, 2012
    Publication date: October 3, 2013
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Bart Schipper
  • Patent number: 8362441
    Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: January 29, 2013
    Assignee: Mapper Lithography IP B.V.
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Bart Schipper
  • Publication number: 20110084592
    Abstract: The invention relates to a high voltage shielding arrangement comprising a first metal part and a second metal part positioned in close vicinity to said first metal part. Said second metal part included in said arrangement to be set at an electrical potential that is lower than the electric potential of the first metal part. Said second metal part having comprising one or more edges and an insulator. The second metal part is at least partially encapsulated by the insulator facing the first metal part.
    Type: Application
    Filed: October 5, 2010
    Publication date: April 14, 2011
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Norman Hendrikus Rudolf Baars, Bart Schipper
  • Publication number: 20110084220
    Abstract: The present invention relates to a projection leis assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
    Type: Application
    Filed: October 8, 2010
    Publication date: April 14, 2011
    Inventors: Johan Joost Koning, Stijn Willem Herman Steenbrink, Bart Schipper
  • Publication number: 20070182303
    Abstract: A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
    Type: Application
    Filed: January 5, 2007
    Publication date: August 9, 2007
    Inventors: Stijn Willem Herman Steenbrink, Pieter Kruit
  • Publication number: 20070064213
    Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.
    Type: Application
    Filed: September 15, 2006
    Publication date: March 22, 2007
    Inventors: Remco Jager, Aukje Arianne Kastelijn, Guido Boer, Marco Jan Wieland, Stijn Willem Herman Steenbrink
  • Publication number: 20060028114
    Abstract: A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
    Type: Application
    Filed: February 13, 2004
    Publication date: February 9, 2006
    Inventors: Stijn Willem Herman Steenbrink, Pieter Kruit